TY  - CONF
AU  - Andras Vladar
AU  - Michael Postek
AU  - Nien Zhang
AU  - Robert Larrabee
AU  - Samuel Jones
AU  - Russell Hajdaj
C2  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XV, Neal T. Sullivan, Editor, Santa Clara, CA
DA  - 2001-08-01
LA  - en
M1  - 4344
PB  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XV, Neal T. Sullivan, Editor, Santa Clara, CA
PY  - 2001
TI  - Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
ER  -