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Nanoscale Reliability Group

The Nanoscale Reliability Group develops and disseminates science, standards, and technology for high-resolution measurements of material structure, chemistry, and physical properties, to ensure reliability of materials and devices with critical dimensions in the micrometer to nanometer regime.

The performance of advanced, reliable engineering materials requires that the proper atoms are in the correct place within the material, and that they are displaying the properties we intend.  Innovative metrologies are developed and demonstrated in the realms of electron, ion, and scanned probe microscopies, to identify and locate atomic species, and to determine physical responses of materials. Test structures, measurement methods, and in situ and in operando approaches are developed to measure performance of complex material systems and geometries with high spatial resolution, enabling new reliability physics to be applied to nanoscale structures for computing, electronics, structural material, and energy applications. We integrate material structure metrologies with material performance and reliability assessments. 

GROUP PATENTS

NIST encourages patent protection on inventions when a patent would further the interests of U.S. manufacturing, increase the potential for current or future commercialization or use of the technology, would likely to lead to a license, would have a positive impact on a new field of science or technology and/or the visibility and vitality of NIST, or would further the goals of collaborative agreements.

Although patents are issued in the name of the inventor, the rights to inventions resulting from government work belong to the government. NIST's Technology Partnerships Office negotiates licensing of patented NIST technology.

Sample holder, detector mask, and scope system for analytical transmission scanning electron microscopy
9,970,859; 9,746,415

Imaging spectrometer for extreme ultraviolet atom probe tomography
10,153,144; 9,899,197

Electron vibrometer for atomic force microscopy
10,060,946

Recent Group Highlights

Researchers from the Nanoscale Reliability Group partnered with RadTech to develop and host the inaugural Photopolymer Additive Manufacturing Workshop: Roadmapping a Future for Stereolithography, Inkjet, and Beyond in October 2019.

News and Updates

Events

Projects and Programs

Photopolymer Additive Manufacturing

NIST's goal is to support innovation in the PAM industry by enabling unprecedented high-resolution, mechanically-precise vat photopolymerization via fundamental

Nanotube Quality Control

Our goal is to develop new methods to rapidly screen bulk carbon nanotubes for chemical purity and homogeneity. The different synthesis routes used to produce

Electronic Material Characterization

To provide the necessary information for electronic material manufacturers to predict how and when failures will occur and enable lifetime analysis appropriate

Extreme Atom Probe Tomography

NIST is engaged in a joint effort between the Material Measurement Laboratory (MML) and the Physical Measurement Laboratory (PML) aimed at revolutionizing 3D

Publications

Awards

Contacts

Group Leader