NIST's goal is to support innovation in the PAM industry by enabling unprecedented high-resolution, mechanically-precise vat photopolymerization via fundamental understanding informed by novel voxel and sub-voxel-scale characterization throughout all major stages of the printing process. This is a sister project of the Scanned Probe Microscopy for Advanced Materials and Processes Project, also led by Jason Killgore.
December 2020: NIST published 2 new manuscripts related to custom instrumentation for PAM characterization. The first manuscript "Digital light processing in a hybrid atomic force microscope: In Situ, nanoscale characterization of the printing process" describes the design and application of a novel instrument that combines a PAM light engine with the nanoscale characterization capabilities of an atomic force microscope. The instrument will enable numerous in situ characterization modes, three of which are described in the manuscript. The second manuscript "Voxel-Scale Conversion Mapping Informs Intrinsic Resolution in Stereolithographic Additive Manufacturing" applies the above instrument to locally map reaction and diffusion in the vicinity of a microscale photopattern, in a thiol-ene resin. The findings show that oligomers can diffuse large distances away from the photopattern, compromising high resolution printing.
The conversion mapping work was covered widely in the additive manufacturing media, as seen in the below links.
August 2020: NIST and Radtech hosted a webinar debrief of the findings from the 2019 PAM workshop. A recording of the webinar is available here. The webinar was moderated by Dianne Poster (NIST) and Mike Idacavage (RadTech). Speakers Included Callie Higgins (NIST), Jason Killgore (NIST), Neil Cramer (Colorado Photopolymer Solutions), Tom McKeag (UC Berkely), Max Zieringer (FormLabs) and Treye Thomas (US Consumer Product Safety Commission).
October 2019: NIST and Radtech hosted the PAM stakeholder community at the Boulder campus for PAM Workshop: Roadmapping a Future for Stereolithography, Inkjet, and Beyond. The attendees identified the following challenges and recommended research directions (more details in forthcoming summary and report).
Overarching Challenges to Advancing PAM Technology
Recommended Research Directions