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Search Publications by: Christopher Soles (Fed)

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Displaying 126 - 150 of 334

Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers

December 9, 2008
Author(s)
Heather J. Patrick, Thomas A. Germer, Yifu Ding, Hyun Wook Ro, Lee J. Richter, Christopher L. Soles
We use optical scatterometry to extract the time evolution of the profile of nanoimprinted lines in low and high molecular mass polymer gratings during reflow at the glass transition temperature. The data are obtained continuously during the anneal using a

MATERIALS SCIENCE: Nanoscale Polymer Processing

October 31, 2008
Author(s)
Christopher L. Soles, Yifu Ding
Plastics are ubiquitous in our modern world. It difficult to find a manufactured object that does not contain at least some sort polymeric (plastic) components. This ubiquity, in large part, reflects the ease with which polymers can be formed at low

Crystallization of Poly(ethylene oxide) on Topographically Patterned Substrates

October 16, 2008
Author(s)
Brian C. Okerberg, Christopher Soles, Jack F. Douglas, Alamgir Karim
Crystallization of poly(ethylene oxide) (PEO) on topographically patterned substrates is investigated. Primary nucleation was dramatically enhanced during solvent drying on patterned substrates compared to flat films. The nucleation density also increased

Quantifying Changes in the Fast Dynamics of Mixtures by Dielectric Spectroscopy

September 26, 2008
Author(s)
Tatiana Psurek, Christopher L. Soles, Kirt A. Page, Marcus T. Cicerone, Jack F. Douglas
The addition of a solvent or nanoparticles to a polymeric material can lead toappreciable changes in the rates of relaxation and reaction that can profoundly alter material properties and function. We introduce a general theoretical strategy for

Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns

June 10, 2008
Author(s)
Yifu Ding, Hyun Wook Ro, Jing N. Zhou, Brian C. Okerberg, Jack F. Douglas, Alamgir Karim, Christopher L. Soles
Understanding polymer deformation during the nanoimprinting process is key to achieve robust polymer nanostructures. Information regarding the process can be extracted from monitoring the decay of the imprinted polymer patterns during thermal annealing. In

Self-Sealing Nanoporous Low-k Dielectric Patterns Created by Nanoimprint Lithography

April 15, 2008
Author(s)
Hyun Wook Ro, H Peng, Ken-ich Nihara, Hae-Jeong Lee, Eric K. Lin, Alamgir Karim, D Gidley, Hiropshi Jinai, Do Y. Yoon, Christopher L. Soles
In this letter we describe how highly porous nanostructures can be directly printed into a poly(methylsilsequioxane) (PMSQ)-based organosilicate film, with high pattern fidelity, and develop the measurement infrastructure to quantitatively evaluate the

Monitoring Alignment of Osteoblast Cells Directed by Gradient Nanopatterns

April 6, 2008
Author(s)
Jirun Sun, Yifu Ding, Nancy J. Lin, Hyun Wook Ro, Christopher L. Soles, Sheng Lin-Gibson
We investigated the behavior of pre-osteoblasts cultured on polystyrene and photopolymerized ethoxylated bisphenol-A dimethacrylate gradient patterns. Gradient patterns varying in height from several hundred to 0 nm were prepared using nanoimprinting

Characterizing Pattern Structures Using X-Ray Reflectivity

March 28, 2008
Author(s)
Hae-Jeong Lee, Christopher L. Soles, Hyun Wook Ro, Shuhui Kang, Eric K. Lin, Alamgir Karim, Wen-Li Wu
Specular X-ray reflectivity (SXR) can be used, in the limit of the effective medium approximation (EMA), as a high-resolution shape metrology for periodic patterns on a planar substrate. The EMA means that the density of the solid pattern and the space

Line Width Roughness and Cross Sectional Measurements of Sub-50 nm Structures with CD-SAXS and CD-SEM

March 24, 2008
Author(s)
Chengqing C. Wang, Ronald L. Jones, Kwang-Woo Choi, Christopher L. Soles, Eric K. Lin, Wen-Li Wu, James S. Clarke, John S. Villarrubia, Benjamin Bunday
Critical dimension small angle x-ray scattering (CD-SAXS) is a measurement platform which is capable of measuring the average cross section and sidewall roughness in patterns ranging from (10 to 500) nm in pitch with sub nm precision. These capabilities

Single cantilever peel test for analysis of adhesion strength in nanotransfer printing

February 17, 2008
Author(s)
Deuk Y. Lee, Gottlieb Oehrlein, Daniel R. Hines, Jiong Liu, Jun Y. Chung, Christopher Stafford, Christopher Soles, Eric K. Lin
Nanotransfer printing (NTP) has attracted much attention as a method for fabricating nanoscale structures using materials that are not generally compatible with conventional lithographic techniques. For NTP of a polymer film to a polymer substrate, thermal