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Search Publications by: Christopher Soles (Fed)

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Displaying 151 - 174 of 174

Reaction Front Induced Roughness in Chemically Amplified Photoresists

August 1, 2002
Author(s)
Vivek Prabhu, Ronald L. Jones, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Christopher Soles, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
We have examined, with tapping mode atomic force microscopy(AFM), the effect of post-exposure bake times and developer on surface roughness using model bilayer interfaces of deuterium-labeled poly(tert-butyloxycarbonyloxy styrene) and poly(hydroxystyrene)

Direct Measurement of the Reaction Front in Chemically Amplified Photoresists

July 1, 2002
Author(s)
Eric K. Lin, Sushil K. Satija, Wen-Li Wu, Christopher L. Soles, D L. Goldfarb, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Willson
The continuing drive by the semiconductor industry to fabricate smaller structures with photolithography will soon require dimensional control at length scales, (2 to 5) nm, comparable to the size of the polymeric molecules in the materials used to pattern

Probing Surface and Bulk Chemistry in Resist Films Using Near Edge X-Ray Absorption Fine Structure

May 1, 2002
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Eric K. Lin, Christopher Soles, Wen-Li Wu, Daniel A. Fischer, S Sambasivan, D L. Goldfarb, M Angelopoulos
Control of the shape, critical dimension (CD), and roughness is critical for the fabrication of sub 100 nm features, where the CD and roughness budget are approaching the molecular dimension of the resist polymers. One focus of our research is identifying

Controlling Morphology During Pattern Development in Thin Film Photoresists

February 1, 2002
Author(s)
Ronald L. Jones, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Christopher L. Soles, Wen-Li Wu
We report on attempts to control surface morphology using current lithographic processes critical to the development of both inorganic and organic nano-structures. Bilayers of protected (base insoluble) and deprotected (base soluble) model lithographic

A Combinatorial Methodology to Discovering the Material Factors Controlling Resist Line Edge Roughness, Shape, and Critical Dimension

January 28, 2002
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Eric K. Lin, Christopher Soles, Wen-Li Wu, D M. Goldfarb, M Angelopoulos
A combinatorial research methodology is discussed to determine the material factors that control line edge roughness (LER), shape, and critical dimension (CD) of developed photo-resist features. The approach involves generating a gradient of processing

A Broad Perspective on the Dynamics of Highly Confined Polymer Films

January 1, 2002
Author(s)
Christopher L. Soles, Jack F. Douglas, Wen-Li Wu, H Peng, D W. Gidley
The manner in which the dynamics of a polymer are affected by thin film confinement is of technological significance, impacting thin film applications such as lubricants, adhesives, and chemically amplified photoresists. In this manuscript we use specular

Incoherent Neutron Scattering and the Dynamics of Confined Polycarbonate Films

January 1, 2002
Author(s)
Christopher L. Soles, Jack F. Douglas, Wen-Li Wu, Robert M. Dimeo
Incoherent elastic neutron scattering measurements are performed on thin (1015 to 75 ) polycarbonate films supported on Si wafers. The mean-square atomic displacement is determined by fitting the intensity data to the Debye-Waller factor and we find that

Confinement Effects on the Spatial Extent of the Reaction Front in Ultrathin Chemically Amplified Photoresists

December 1, 2001
Author(s)
D L. Goldfarb, M Angelopoulos, Eric K. Lin, Ronald L. Jones, Christopher Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu
Sub-100 nm lithography poses strict requirements on photoresist material properties and processing conditions to achieve necessary critical dimension (CD) control of patterned structures. As resist thickness and feature linewidth decrease, fundamental

Thin Film Confinement Effects on the Thermal Properties of Model Photoresist Polymers

December 1, 2001
Author(s)
Christopher L. Soles, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
The demand to print increasingly smaller microelectronic device features means that the thickness of the polymer films used in the lithographic processes must decrease. The thickness of these films is rapidly approaching the unperturbed dimensions of the

Characterization of Thin and Ultrathin Polymer and Resist Films

August 1, 2001
Author(s)
D L. Goldfarb, Q Lin, M Angelopoulos, Christopher Soles, Eric K. Lin, Wen-Li Wu
The need for a better understanding of the physicochemical properties of radiation-sensitive thin polymer coatings for lithographic applications is driven by the trend of ever-shrinking pattern dimensions and film thickness, imposed by the semiconductor
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