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Search Publications by: Christopher Soles (Fed)

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Displaying 76 - 100 of 174

Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns

June 10, 2008
Author(s)
Yifu Ding, Hyun Wook Ro, Jing N. Zhou, Brian C. Okerberg, Jack F. Douglas, Alamgir Karim, Christopher L. Soles
Understanding polymer deformation during the nanoimprinting process is key to achieve robust polymer nanostructures. Information regarding the process can be extracted from monitoring the decay of the imprinted polymer patterns during thermal annealing. In

Self-Sealing Nanoporous Low-k Dielectric Patterns Created by Nanoimprint Lithography

April 15, 2008
Author(s)
Hyun Wook Ro, H Peng, Ken-ich Nihara, Hae-Jeong Lee, Eric K. Lin, Alamgir Karim, D Gidley, Hiropshi Jinai, Do Y. Yoon, Christopher L. Soles
In this letter we describe how highly porous nanostructures can be directly printed into a poly(methylsilsequioxane) (PMSQ)-based organosilicate film, with high pattern fidelity, and develop the measurement infrastructure to quantitatively evaluate the

Monitoring Alignment of Osteoblast Cells Directed by Gradient Nanopatterns

April 6, 2008
Author(s)
Jirun Sun, Yifu Ding, Nancy J. Lin, Hyun Wook Ro, Christopher L. Soles, Sheng Lin-Gibson
We investigated the behavior of pre-osteoblasts cultured on polystyrene and photopolymerized ethoxylated bisphenol-A dimethacrylate gradient patterns. Gradient patterns varying in height from several hundred to 0 nm were prepared using nanoimprinting

Characterizing Pattern Structures Using X-Ray Reflectivity

March 28, 2008
Author(s)
Hae-Jeong Lee, Christopher L. Soles, Hyun Wook Ro, Shuhui Kang, Eric K. Lin, Alamgir Karim, Wen-Li Wu
Specular X-ray reflectivity (SXR) can be used, in the limit of the effective medium approximation (EMA), as a high-resolution shape metrology for periodic patterns on a planar substrate. The EMA means that the density of the solid pattern and the space

Line Width Roughness and Cross Sectional Measurements of Sub-50 nm Structures with CD-SAXS and CD-SEM

March 24, 2008
Author(s)
Chengqing C. Wang, Ronald L. Jones, Kwang-Woo Choi, Christopher L. Soles, Eric K. Lin, Wen-Li Wu, James S. Clarke, John S. Villarrubia, Benjamin Bunday
Critical dimension small angle x-ray scattering (CD-SAXS) is a measurement platform which is capable of measuring the average cross section and sidewall roughness in patterns ranging from (10 to 500) nm in pitch with sub nm precision. These capabilities

Single cantilever peel test for analysis of adhesion strength in nanotransfer printing

February 17, 2008
Author(s)
Deuk Y. Lee, Gottlieb Oehrlein, Daniel R. Hines, Jiong Liu, Jun Y. Chung, Christopher Stafford, Christopher Soles, Eric K. Lin
Nanotransfer printing (NTP) has attracted much attention as a method for fabricating nanoscale structures using materials that are not generally compatible with conventional lithographic techniques. For NTP of a polymer film to a polymer substrate, thermal

The Direct Patterning of Nanoporous Interlayer Dielectric Insulator Films by Nanoimprint Lithography

October 2, 2007
Author(s)
Hyun Wook Ro, Ronald L. Jones, H Peng, Daniel R. Hines, Hae-Jeong Lee, Eric K. Lin, Alamgir Karim, Do Y. Yoon, D Gidley, Christopher L. Soles
Directly patterning dielectric insulator materials via nanoimprint lithography has the potential to simplify fabrication processes and significantly reduce the manufacturing costs for semiconductor devices. However, the prospect of mechanically forming

Relaxation Behavior of Polymer Structures Fabricated by Nanoimprint Lithography

August 14, 2007
Author(s)
Yifu Ding, Hyun Wook Ro, Thomas A. Germer, Jack F. Douglas, Brian C. Okerberg, Alamgir Karim, Christopher L. Soles
We study the decay of the imprinted polystyrene (PS) patterns under thermal annealing using light diffraction. The first order diffraction intensity from the imprinted gratings was measured as a function of annealing time. Local intensity maximum is

Polymer Viscoelasticity and Residual Stress Effects on Nanoimprint Lithography

May 24, 2007
Author(s)
Yifu Ding, Hyun Wook Ro, Jack F. Douglas, Ronald L. Jones, Daniel R. Hines, Alamgir Karim, Christopher L. Soles
We examine the influence of viscoelastic effects on the stability of nanoimprinted polymer films. The decay of features for polymers below the critical entanglement molecular mass at elevated temperatures is determined by simple surface tension and the

Crystallization of Polyethylene Oxide Patterend by Nanoimprint Lithography

March 28, 2007
Author(s)
Brian C. Okerberg, Christopher L. Soles, Jack F. Douglas, Hyun Wook Ro, Alamgir Karim
The crystallization behavior of poly(ethylene oxide) (PEO) films patterned by nanoimprint lithography is studied. The imprinted PEO film consists of parallel lines, approximately 240 nm wide and 320 nm tall, on a 400 nm pitch with a residual layer of

Mechanically Robust Spin-On Organosilicates Glasses for Nanoporous Applications

February 7, 2007
Author(s)
Hyun Wook Ro, K Char, Eun-Chae Jeon, H C. Kim, Dongil Kwon, Hae-Jeong Lee, J. H. Lee, Hee-Woo Rhee, Christopher L. Soles, Do Y. Yoon
An increasing number of technologies demand nanoporous materials with vastly improved physical, mechanical and thermal properties. This manuscript develops the microstructural basis for synthesizing organosilicate glasses (OSGs) with unprecedented thermal

Evidence for Internal Stresses Induced by Nanoimprint Lithography

November 30, 2006
Author(s)
Hyun Wook Ro, Yifu Ding, Hae-Jeong Lee, Daniel R. Hines, Ronald L. Jones, Eric K. Lin, Alamgir Karim, Wen-Li Wu, Christopher L. Soles
The thermal embossing form of nanoimprint lithography is used to pattern arrays of nanostructures into several different polymer films. The shape of the imprinted patterns is characterized with nm precision using both X-ray scattering and reflectivity

Structural Characteristics of Methylsilsesquioxane Based Porous Low-k Thin Films Fabricated with Increasing Cross-Linked Particle Porogen Loading

September 1, 2006
Author(s)
Hae-Jeong Lee, Christopher L. Soles, Da-Wei Liu, Barry J. Bauer, Eric K. Lin, Wen-Li Wu
Methylsilsesquioxane (MSQ) based porous low-k dielectric films with different porogen loading have been characterized using X-ray porosimetry (XRP) to determine their pore size distribution, average density, wall density and porosity. By varying the

The Glass Transition of Miscible Binary Polymer-Polymer Thin Films

August 4, 2006
Author(s)
Brian M. Bescancon, Christopher Soles, P A. Green
The average glass transition temperatures, Tg, of thin homopolymer films exhibit a thickness dependence, Tg(h), determined by a confinement effect and by the polymer segment/interface interactions. The Tgs of completely miscible thin film blends of

Real Time Shape Evolution of Nanoimprinted Polymer Structures During Thermal Annealing

July 18, 2006
Author(s)
Ronald L. Jones, T Hu, Christopher L. Soles, Eric K. Lin, R M. Reano, Stella W. Pang, D M. Casa
The real time shape of nanoimprinted polymer patterns are measured as a function of annealing temperature and time using a new metrology technique, Critical Dimension Small Angle X-ray Scattering (CD-SAXS). Periodicity, linewidth, line height, and sidewall

Elastodynamic characterization of imprinted nanolines

April 3, 2006
Author(s)
Ward L. Johnson, Colm Flannery, Sudook A. Kim, Roy H. Geiss, Christopher Soles, Paul R. Heyliger
Experimental techniques employing Brillouin light scattering (BLS) and analytical techniques employing finite-element (FE) and Farnell-Adler models are being developed for characterizing acoustic modes and determining elastic moduli and dimensions of

Effect of Initial Resist Thickness on Residual Layer Thickness of Nanoimprinted Structures

December 1, 2005
Author(s)
Hae-Jeong Lee, Hyun Wook Ro, Christopher L. Soles, Ronald L. Jones, Eric K. Lin, Wen-Li Wu, Daniel R. Hines
Accurate quantification and control of the residual layer thickness is a critical challenge to achieving sub-50 nm patterning with nanoimprint lithography. While characterization to within a few nanometers is essential, there is currently a lack of

Acoustic Modes and Elastic Properties of Polymeric Nanostructures

October 21, 2005
Author(s)
R Hartschuh, A Kisliuk, V N. Novikov, Alexei Sokolov, Paul R. Heyliger, Colm Flannery, Ward L. Johnson, Christopher Soles, Wen-Li Wu
Fabricating mechanically robust polymer structures with nanoscale dimensions is critical for a wide range of emerging technologies. The rigidity of such structures is expected to change as the feature sizes approach the characteristic dimensions of the

Characterization of Ordered Mesoporous Silica Films Using Small-Angle Neutron Scattering and X Ray Porosimetry

March 1, 2005
Author(s)
B D. Vogt, R A. Pai, V. J. Lee, R C. Hedden, Christopher L. Soles, Wen-Li Wu, Eric K. Lin, Barry J. Bauer, J J. Watkins
Ordered mesoporous silica films were synthesized using pre-organized block copolymer templates in supercritical carbon dioxide. Poly(ethylene oxide-block-propylene oxide-block-ethylene oxide), PEO-bPPO-b-PEO,films doped with p-toluenesulfonic acid (p-TSA)
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