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X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films

Published

Author(s)

J L. Lenhart, Daniel A. Fischer, S Sambasivan, Eric K. Lin, R L. Jones, Christopher Soles, Weida Wu, D L. Goldfarb, M Angelopoulos
Citation
Langmuir
Volume
21
Issue
9

Citation

Lenhart, J. , Fischer, D. , Sambasivan, S. , Lin, E. , Jones, R. , Soles, C. , Wu, W. , Goldfarb, D. and Angelopoulos, M. (2005), X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films, Langmuir, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854243 (Accessed July 23, 2024)

Issues

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Created April 25, 2005, Updated October 12, 2021