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Evidence for Internal Stresses Induced by Nanoimprint Lithography

Published

Author(s)

Hyun Wook Ro, Yifu Ding, Hae-Jeong Lee, Daniel R. Hines, Ronald L. Jones, Eric K. Lin, Alamgir Karim, Wen-Li Wu, Christopher L. Soles

Abstract

The thermal embossing form of nanoimprint lithography is used to pattern arrays of nanostructures into several different polymer films. The shape of the imprinted patterns is characterized with nm precision using both X-ray scattering and reflectivity techniques. By studying the time dependent response of the pattern shape at temperatures near the glass transition temperature, we are able to perceive large levels of residual stress induced by the imprinting process. The large shear fields that result as the viscous polymer flows into the mold leads to internal stresses.At elevated temperatures in the freestanding structures (once the mold has been separated from the imprint), there is an accelerated reduction in pattern height in the reverse direction from which the material originally flowed into the mold. Factors that influence this residual stress include the molecular mass or viscosity of the polymer resist and the amount of time the pattern is annealed at high temperature in the presence of the mold.
Citation
Journal of Vacuum Science and Technology B
Volume
24
Issue
6

Keywords

critical dimension, nanoimprint lithography, pattern shape, residual stress, small angle scattering, thickness, X-ray reflectivity

Citation

, H. , Ding, Y. , Lee, H. , Hines, D. , Jones, R. , Lin, E. , Karim, A. , Wu, W. and Soles, C. (2006), Evidence for Internal Stresses Induced by Nanoimprint Lithography, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852638 (Accessed June 16, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created November 30, 2006, Updated February 19, 2017