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Monitoring Alignment of Osteoblast Cells Directed by Gradient Nanopatterns

Published

Author(s)

Jirun Sun, Yifu Ding, Nancy J. Lin, Hyun Wook Ro, Christopher L. Soles, Sheng Lin-Gibson

Abstract

We investigated the behavior of pre-osteoblasts cultured on polystyrene and photopolymerized ethoxylated bisphenol-A dimethacrylate gradient patterns. Gradient patterns varying in height from several hundred to 0 nm were prepared using nanoimprinting technology and a temperature-controlled stage. These patterns consisted of a 200 or 400 nm line width and a 400 or 800 nm pitch. The pattern height varied in a continuous fashion from several hundred nanometers to a flat surface. The morphology of the cells on these patterns was studied, and cell alignment along the pattern and cell elongation as a function of pattern height were examined.
Conference Dates
April 6-10, 2008
Conference Location
New Orleans, LA
Conference Title
American Chemical Society 235th National Meeting

Keywords

Nanoimprint, Gradient, Cell morphology

Citation

Sun, J. , Ding, Y. , Lin, N. , , H. , Soles, C. and Lin-Gibson, S. (2008), Monitoring Alignment of Osteoblast Cells Directed by Gradient Nanopatterns, American Chemical Society 235th National Meeting, New Orleans, LA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854044 (Accessed July 13, 2024)

Issues

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Created April 6, 2008, Updated February 19, 2017