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Nanoimprint Pattern Transfer Quality from Specular X-Ray Reflectivity

Published

Author(s)

V. J. Lee, Christopher Soles, Hyun W. Ro, Daniel R. Hines, Ronald L. Jones, Eric K. Lin, Wen-Li Wu
Citation
Applied Physics Letters
Volume
87

Keywords

nanoimprint lithography, pattering, pattern fidelity, residual layer, shape metrology, X-ray reflectivity

Citation

Lee, V. , Soles, C. , Ro, H. , Hines, D. , Jones, R. , Lin, E. and Wu, W. (2005), Nanoimprint Pattern Transfer Quality from Specular X-Ray Reflectivity, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852501 (Accessed April 18, 2024)
Created November 30, 2005, Updated October 12, 2021