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Polymer Viscoelasticity and Residual Stress Effects on Nanoimprint Lithography

Published

Author(s)

Yifu Ding, Hyun Wook Ro, Jack F. Douglas, Ronald L. Jones, Daniel R. Hines, Alamgir Karim, Christopher L. Soles

Abstract

We examine the influence of viscoelastic effects on the stability of nanoimprinted polymer films. The decay of features for polymers below the critical entanglement molecular mass at elevated temperatures is determined by simple surface tension and the film viscosity. By contrast, high molecular mass (entangled) polymer patterns under similar conditions exhibit a rapid elastic deformation, followed by an Andrade creep regime of plastic deformation and finally fluid flow at long times. We conclude that these viscoelastic effects have a profound effect on the structural stability of nanoimprinted polymer structures and these nonlinear effects must be considered in the development of nanoimprinting applications.
Citation
Advanced Materials
Volume
19

Keywords

critical dimension, nanoimprint lithography, nanotechnology, patterning, small angle scattering, stability, stress, viscoelasticity, X-ray reflectivity

Citation

Ding, Y. , , H. , Douglas, J. , Jones, R. , Hines, D. , Karim, A. and Soles, C. (2007), Polymer Viscoelasticity and Residual Stress Effects on Nanoimprint Lithography, Advanced Materials, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852665 (Accessed May 24, 2024)

Issues

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Created May 24, 2007, Updated February 19, 2017