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Nanotechnology

Nanometrology

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Displaying 101 - 125 of 866

Fast quantification of nanorod geometry by DMA-spICP-MS

February 18, 2019
Author(s)
Jiaojie Tan, Yong Yang, Hind El Hadri, Mingdong M. Li, Vincent A. Hackley, Michael R. Zachariah
A fast, quantitative method for determining the geometries of nanorods (i.e., length and dimeter) is described, based on hyphenation of differential mobility analysis (DMA) with single particle inductively coupled plasma mass spectrometry (spICP-MS). Seven

X-ray Metrology for the Semiconductor Industry Tutorial

February 1, 2019
Author(s)
Daniel F. Sunday, Wen-Li Wu, Scott Barton, Regis J. Kline
The semiconductor industry is in need of new, in-line dimensional metrology methods with higher spatial resolution for characterizing their next generation nanodevices. The purpose of this short course is to train the semiconductor industry on the NIST

Defect Evolution of Ion-Exposed Single-Wall Carbon Nanotubes

January 3, 2019
Author(s)
Jana Kalbacova, Elias J. Garratt, Raul D. Rodriguez, Angela R. Hight Walker, Kevin A. Twedt, Jeffrey Fagan, Teresa I. Madeira, Jabez J. McClelland, Babak Nikoobakht, Dietrich R. Zahn
A systematic evaluation of defects is essential to understand and engineer device properties and applications. Raman spectroscopy is employed for the characterization of carbon nanomaterials in particular to quantitatively evaluate defects from the

NIST Nanotechnology Environmental, Health, and Safety Research Program: 20092016

November 27, 2018
Author(s)
Debra L. Kaiser, Vincent A. Hackley
In response to needs of a government-wide initiative in nanotechnology led by a subcommittee within the White House’s Office of Science and Technology Policy, NIST established a nanotechnology environmental, health, and safety (nano-EHS) research program

Validation of Single Particle ICP-MS for Routine Measurements of Nanoparticle Size and Number Size Distribution

November 25, 2018
Author(s)
Antonio R. Montoro Bustos, Premsagar P. Kavuri, Antonio M. Possolo, Natalia Farkas, Andras Vladar, Karen E. Murphy, Michael R. Winchester
Single particle inductively coupled plasma-mass spectrometry (spICP-MS) is an emerging technique capable of measuring nanoparticle size and number concentration simultaneously, of metal-containing nanoparticles (NPs) at environmentally relevant levels

An energy-resolved atomic scanning probe

November 21, 2018
Author(s)
Daniel S. Gruss, Chih-Chun Chien, Julio T. Barreiro, Massimiliano Di Ventra, Michael P. Zwolak
The density of states is a concept that is ubiquitous in classical and quantum physics, since it quantifies the energy distribution of states available in a system. Spectroscopic means allow its measurement over the entirety of a system's energy spectrum

Particle tracking of microelectromechanical system performance and reliability

October 25, 2018
Author(s)
Craig R. Copeland, Craig D. McGray, Jon C. Geist, Samuel M. Stavis
Microelectromechanical systems (MEMS) that require contact of moving parts to implement complex functions have demonstrated critical limits of performance and reliability. Here, we advance a particle tracking method to measure MEMS motion in operando at

Metrology for the next generation of semiconductor devices

October 12, 2018
Author(s)
Ndubuisi G. Orji, Mustafa Badaroglu, Bryan M. Barnes, Carlos Beitia, Benjamin D. Bunday, Umberto Celano, Regis J. Kline, Mark Neisser, Yaw S. Obeng, Andras Vladar
The semiconductor industry continues to produce ever smaller devices that are ever more complex in shape and contain ever more types of materials. The ultimate sizes and functionality of these new devices will be affected by fundamental and engineering

Spatial Dimensions in Atomic Force Microscopy: Instruments, Effects, and Measurements

August 15, 2018
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, Ichiko Misumi, Gaoliang Dai
Atomic force microscopes (AFMs) are commonly and broadly regarded as being capable of three dimensional imaging. However, conventional AFMs suffer from both significant functional constraints and imaging artifacts that render them less than fully three

Subnanometer localization accuracy in widefield optical microscopy

July 11, 2018
Author(s)
Craig R. Copeland, Jon C. Geist, Craig D. McGray, Vladimir A. Aksyuk, James A. Liddle, Bojan R. Ilic, Samuel M. Stavis
The common assumption that precision is the limit of accuracy in localization microscopy and the typical absence of comprehensive calibration of optical microscopes lead to a widespread issue - overconfidence in measurement results with nanoscale
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