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Manufacturing

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Displaying 1551 - 1575 of 2179

Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications

March 1, 2004
Author(s)
James D. Gilsinn, Hui Zhou, Bradley N. Damazo, Joseph Fu, Richard M. Silver
As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One difficulty

A Multiscale Fabrication Approach to Microfluidic System Development

January 1, 2004
Author(s)
Tony L. Schmitz, John A. Dagata, Brian S. Dutterer, W G. Sawyer
Microfluidic systems for analytical, medical, and sensing applications integrate optical or electrical readouts in low-cost, low-volume consumption systems. Embedding chemically functionalized templates with nanoscale topography within these devices links

Atomic-Resolution Measurements With a New Tunable Diode Laser-Based Interferometer

January 1, 2004
Author(s)
Richard M. Silver, H Zou, S Gonda, Bradley N. Damazo, Jay S. Jun, Carsten P. Jensen, Lowell P. Howard
We have developed a new implementation of a Michelson interferometer which has demonstrated better than 20 picometer resolution measurement capability. This new method uses a tunable diode laser as the light source with the laser wavelength continuously

Initial Measurement Results for 20 NIST RM 8240 Standard Bullets

January 1, 2004
Author(s)
Li Ma, Jun-Feng Song, Eric P. Whitenton, Theodore V. Vorburger, J Zhou, A Zheng
The SRM (Standard Reference Material) 2460 standard bullets are developed at the National Institute of Standards and Technology (NIST) to support the National Integrated Ballistics Information Network (NIBIN), recently established by the Bureau of Alcohol

Initial Measurement Results for 40 NIST RM 8240 Standard Bullets

January 1, 2004
Author(s)
Jun-Feng Song, Eric P. Whitenton, Li Ma, Theodore V. Vorburger, A Zheng
The RM (Reference Material) 8240 standard bullets are developed at the National Institute of Standards and Technology (NIST) to support the National Integrated Ballistics Information Network (NIBIN), recently established by the Bureau of Alcohol, Tobacco

Interim Report on Single Crystal Critical Dimension Reference Materials (SCCDRM)

January 1, 2004
Author(s)
Ronald G. Dixson, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Brandon Park, Christine E. Murabito, Joaquin (. Martinez
The single crystal critical dimension reference materials (SCCDRM) project has been completed, and the samples for the SEMATECH member companies have been released for distribution. The final technology transfer report is currently undergoing revision and

Progress Towards SI Traceable Force Metrology for Nanomechanics

January 1, 2004
Author(s)
David B. Newell, Eric P. Whitenton, John A. Kramar, Jon R. Pratt, Douglas T. Smith
This paper is based, in its entirety, on NIST-approved publications: Calibration of Piezoresistive Cantilever Force Sensors Using the NIST Electrostatic Force Balance, The NIST Electrostatic Force Balance Experiment, The NIST Microforce Realization and

Progress Towards Systeme International d'Unites Traceable Force Metrology for Nanomechanics

January 1, 2004
Author(s)
Jon R. Pratt, Douglas T. Smith, David B. Newell, John A. Kramar, Eric P. Whitenton
Recent experiments with the National Institute of Standards and Technology (NIST) Electrostatic Force Balance (EFB) have achieved agreement between an electrostatic force and a gravitational force of 10^(-5) N to within a few hundred pN/¿N. This result

Scattering by a Sphere with a Dielectric Half-Space or on Another Sphere

January 1, 2004
Author(s)
Egon Marx
Particle contamination of dielectric or conducting surfaces can be detected by shining light on the surface and looking for abnormal scattering distributions. This procedure can be simulated by computing the scattering distribution for a dielectric sphere

Shape-Sensitive Linewidth Measurements of Resist Structures

January 1, 2004
Author(s)
John S. Villarrubia, Andras Vladar, Michael T. Postek
Widths of developed 193 nm resist lines were measured by two methods and compared. One method was a new model-based library method. In this method the scanning electron microscope (SEM) images corresponding to various edge shapes are simulated in advance

Tip Characterization for Dimensional Nanometrology

January 1, 2004
Author(s)
John S. Villarrubia
Abstract: Technological trends are increasingly requiring dimensional metrology at size scales below a micrometer. Scanning probe microscopy has unique advantages in this size regime, but width and roughness measurements must be corrected for imaging

UML 2 Activity and Action Models, Part 3: Control Nodes

January 1, 2004
Author(s)
Conrad E. Bock
This is the third in a series introducing the activity model in the Unified Modeling Language, version 2 (UML 2), and how it integrates with the action model. The previous article addressed the execution characteristics of actions in general, and

UML 2 Activity and Action Models, Part 4: Object Nodes

January 1, 2004
Author(s)
Conrad E. Bock
This is the fourth in a series introducing the activity model in the Unified Modeling Language, version 2 (UML 2), and how it integrates with the action model [1]. The first article gives an overview of activities and actions [2], while the second two
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