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Manufacturing

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Displaying 1501 - 1525 of 2179

Line Edge Roughness Metrology Using Atomic Force Microscopes

January 1, 2005
Author(s)
Ndubuisi G. Orji, Theodore V. Vorburger, Joseph Fu, Ronald G. Dixson, C Nguyen, Jayaraman Raja
Line edge roughness measurements using two types of atomic force microscopes and two types of tips are compared. Measurements were made on specially prepared samples with inscribed edge roughness of different amplitudes and wavelengths. The spatial

Linewidth Measurement from a Stitched AFM Image

January 1, 2005
Author(s)
Joseph Fu, Ronald G. Dixson, Ndubuisi G. Orji, Theodore V. Vorburger, C Nguyen
Image stitching is a technique that combines two or more images to form one composite image, which provides a field of view that the originals cannot. It has been widely used in photography, medical imaging, and computer vision and graphics. For such

Measurement Uncertainty, CMMs, and Standards: Today and the Future

January 1, 2005
Author(s)
Steven D. Phillips
Over the past decade modern measurement uncertainty evaluation has evolved from an obscure art practiced at National Measurement Institutes (NMIs) to an increasingly intertwined aspect of industrial metrology. This paper examines the progression of

New Capabilities At NIST In Dimensional Metrology

January 1, 2005
Author(s)
Theodore D. Doiron, Eric S. Stanfield, Bryon S. Faust, John R. Stoup, Mary Abbott
A number of new or revised services in dimensional metrology are presented. Included are: a lower cost, high accuracy calibration for sphere diameter; reduced uncertainty in roundness calibration; a new instrument for measurement of the thermal expansion

Photomask Metrology, Photomask Fabrication Technology

January 1, 2005
Author(s)
Richard M. Silver, Andras Vladar
In this paper we will focus on the different metrology techniques used to measure features on photomasks. In view of the above discussion, we will focus on the importance of accurately measuring features and developing traceability. The metrology

Scanning Electron Microscope Dimensional Metrology using a Model-based Library

January 1, 2005
Author(s)
John S. Villarrubia, Andras Vladar, Michael T. Postek
The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are smaller

The Influence of Defects on the Morphology of Si (111) Etched in NHF

January 1, 2005
Author(s)
Hui Zhou, Joseph Fu, Richard M. Silver
We have implemented a kinetic Monte-Carlo (KMC) simulation to study the morphologies of Si (111) surfaces etched in NHF. Although our initial simulations reproduced the previous results from Hines, it failed to produce the morphologies observed in our

STEP, XML, and UML: Complementary Technologies

December 15, 2004
Author(s)
Russell S. Peak, Joshua Lubell, Vijay Srinivasan, Stephen C. Waterbury
One important aspect of product lifecycle management (PLM)is the computer-sensible representation of product information. Over the past 15 years or so, several languages and technologies have emerged that vary in their emphasis and applicability for such

Internet-Based Surface Metrology Algorithm Testing System

December 1, 2004
Author(s)
Son H. Bui, Thomas B. Renegar, Theodore V. Vorburger, Jayaraman Raja, Mark C. Malburg
This paper presents the development of an Internet-based surface metrology algorithm testing system. The system includes peer-reviewed surface analysis tools and a surface texture specimen database for parameter evaluation and algorithm verification. The

Traceable Pico-Meter Level Step Height Metrology

December 1, 2004
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson, Joseph Fu, Theodore V. Vorburger
The atomic force microscope (AFM) increasingly being used as a metrology tool in the semiconductor industry where the features measured are at the nanometer level and continue to decrease. Usually the height sensors of the AFM are calibrated using step

NNI Workshop Instrumentation and Metrology for Nanotechnology

November 1, 2004
Author(s)
Michael T. Postek, J J. Pellegrino
The NNI Interagency Workshop on Instrumentation and Metrology for Nanotechnology Grand Challenges was held on January 27-29, 2004 in Gaithersburg, Maryland, and was cosponsored by the National Institute of Standards and Technology (NIST), an agency of the

UML 2 Composition Model

October 1, 2004
Author(s)
Conrad E. Bock
The composition model in the Unified Modeling Language, version 2, is a major upgrade to the familiar black diamond composition of earlier versions. It supports connections between parts at the same level of decomposition, in addition to the usual part

Virtual Surface Calibration and Computational Uncertainty

October 1, 2004
Author(s)
Son H. Bui, Theodore V. Vorburger, Thomas B. Renegar
This paper presents the development of a virtual surface calibration database for parameter evaluation and algorithm verification. The database runs from a web site at the National Institute of Standards and Technology (NIST), USA. Companies, universities

NIST's Logistics Integration Solutions

September 1, 2004
Author(s)
Sharon J. Kemmerer
The NIST Manufacturing Interoperability Program staff has years of experience developing standards, validating solutions, and providing interoperability results in the field of manufacturing. Building on this experience, NIST can: (1) Work with industry to
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