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Characterization of Prototype Silicon Pitch Artifacts Fabricated by Scanning Probe Lithography and Anisotropic Wet Etching

Published

Author(s)

F S. Chien, W F. Hsieh, S Gwo, Jay S. Jun, Richard M. Silver, Andras Vladar, John A. Dagata
Citation
Journal of Applied Physics
Volume
23
Issue
No. 1

Keywords

nanofabrication, pattern placement error, probe oxidation, scanning

Citation

Chien, F. , Hsieh, W. , Gwo, S. , Jun, J. , Silver, R. , Vladar, A. and Dagata, J. (2005), Characterization of Prototype Silicon Pitch Artifacts Fabricated by Scanning Probe Lithography and Anisotropic Wet Etching, Journal of Applied Physics (Accessed November 10, 2024)

Issues

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Created December 31, 2004, Updated October 12, 2021