Reference Measurement System Using Critical Dimension Atomic Force Microscopy (CD-AFM): Final Report

Published

January 1, 2005

Author(s)

Ronald G. Dixson

Abstract

SEMATECH and the National Institute of Standards and Technology (NIST) have worked together to implement a Reference Measurement System (RMS) at SEMATECH using a critical-dimension atomic force microscope (CD-AFM). The basic goal of the collaboration is to establish traceable linkage between the realization of the SI (Systeme International d'Unites, or International System of Units) unit of length - the meter - and measurements in semiconductor manufacturing.During the first year of the project, a first stage RMS was implemented at SEMATECH using the SXM320 as a platform - the only available CD-AFM at that time. During the second and third year of the project, the RMS methodology was transferred to the Veeco Dimension X3D - the successor to the SXM320.Uncertainty budgets were developed for pitch, height, and critical dimension (CD) measurements. At present, the standard uncertainties are approximately 0.2 % for pitch measurements and 0.4 % for step height measurements. Until recently, the standard uncertainty in linewidth measurements was 5 nm. However, the recent completion of the single crystal critical dimension reference material (SCCDRM) project has allowed a dramatic reduction in this uncertainty. It is now 1 nm.The reduction in linewidth uncertainty was the result of reducing the magnitude of a single component - the zeroth order tip width correction. Because of the reduction in this term, higher order tip effects are now more significant, and these are one area on which future NIST/SEMATECH collaborations may focus.

Citation

Reference Measurement System Using Critical Dimension Atomic Force Microscopy (CD-AFM): Final Report

Pub Type

Others

Keywords

AFM, calibration, CD, linewidth, reference measurement system

Citation

Dixson, R. (2005), Reference Measurement System Using Critical Dimension Atomic Force Microscopy (CD-AFM): Final Report, Reference Measurement System Using Critical Dimension Atomic Force Microscopy (CD-AFM): Final Report (Accessed October 14, 2025)