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PUBLICATIONS

Photomask Metrology, Photomask Fabrication Technology

Published

Author(s)

Richard M. Silver, Andras Vladar

Abstract

In this paper we will focus on the different metrology techniques used to measure features on photomasks.  In view of the above discussion, we will focus on the importance of accurately measuring features and developing traceability.  The metrology techniques broadly include measuring feature positions, feature dimensions, defect printability, optical phase shifts and those additional elements which contribute to the final image transferred into the resist.  Also, evaluation of the dimensions and flatness of photomask blanks will be discussed.
Citation
Photomask Metrology, Chapter in Photomask Fabrication Technology
Publisher Info
McGraw-Hill Professional, New York, NY
Pub Type
Books

Keywords

feature dimensions, feature positions, metrology, optical phase shifts, photomasks
Manufacturing and Metrology

Citation

Silver, R. and Vladar, A. (2005), Photomask Metrology, Photomask Fabrication Technology, McGraw-Hill Professional, New York, NY (Accessed October 11, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created January 1, 2005, Updated February 19, 2017
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