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Photomask Metrology, Photomask Fabrication Technology

Published

Author(s)

Richard M. Silver, Andras Vladar

Abstract

In this paper we will focus on the different metrology techniques used to measure features on photomasks.  In view of the above discussion, we will focus on the importance of accurately measuring features and developing traceability.  The metrology techniques broadly include measuring feature positions, feature dimensions, defect printability, optical phase shifts and those additional elements which contribute to the final image transferred into the resist.  Also, evaluation of the dimensions and flatness of photomask blanks will be discussed.
Citation
Photomask Metrology, Chapter in Photomask Fabrication Technology
Publisher Info
McGraw-Hill Professional, New York, NY

Keywords

feature dimensions, feature positions, metrology, optical phase shifts, photomasks

Citation

Silver, R. and Vladar, A. (2005), Photomask Metrology, Photomask Fabrication Technology, McGraw-Hill Professional, New York, NY (Accessed April 17, 2024)
Created January 1, 2005, Updated February 19, 2017