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Photomask Metrology, Photomask Fabrication Technology



Richard M. Silver, Andras Vladar


In this paper we will focus on the different metrology techniques used to measure features on photomasks.  In view of the above discussion, we will focus on the importance of accurately measuring features and developing traceability.  The metrology techniques broadly include measuring feature positions, feature dimensions, defect printability, optical phase shifts and those additional elements which contribute to the final image transferred into the resist.  Also, evaluation of the dimensions and flatness of photomask blanks will be discussed.
Photomask Metrology, Chapter in Photomask Fabrication Technology
Publisher Info
McGraw-Hill Professional, New York, NY


feature dimensions, feature positions, metrology, optical phase shifts, photomasks


Silver, R. and Vladar, A. (2005), Photomask Metrology, Photomask Fabrication Technology, McGraw-Hill Professional, New York, NY (Accessed April 17, 2024)
Created January 1, 2005, Updated February 19, 2017