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Simulation of Optical Microscope Images for Photomask Feature Size Measurements

Published

Author(s)

Egon Marx, James E. Potzick

Abstract

Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer.  When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part of the measurement process because the image does not otherwise yield an accurate value of the dimension being measured.  The integral equation form of Maxwell's equations is used in the simulation process described here.
Proceedings Title
Proceedings of 2005 Digest of the IEEE Antennas and Propagation Society International Symposium
Conference Dates
January 1, 2005
Conference Location
Unknown, USA
Conference Title
1998 Digest of the IEEE Antennas and Propagation Society International Symposium

Keywords

linewidth, Maxwell equations, photomask, simulated microscope images, singular integral equations

Citation

Marx, E. and Potzick, J. (2005), Simulation of Optical Microscope Images for Photomask Feature Size Measurements, Proceedings of 2005 Digest of the IEEE Antennas and Propagation Society International Symposium, Unknown, USA (Accessed April 14, 2024)
Created January 1, 2005, Updated June 2, 2021