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Amanda N. Goyettes, G. de Hann, Yicheng Wang, Loucas G. Christophorou, James K. Olthoff
This is a summary report of the paper to be published in the Journal of Chemical Physics. Measurements of electron transport, effective ionization, and attachment coefficients are reported for C 2F 4. In addition, measurements of the electron drift
Allen R. Hefner Jr., David W. Berning, David L. Blackburn, Christophe C. Chapuy, Sebastien Bouche
A new high-speed transient thermal imaging system is presented that provides the capability to measure the transient temperature distributions on the surface of a silicon chip with 1 υs time, and 15 υm spatial resolution. The system uses virtual instrument
Techniques are described for validating the performance of Insulated-Gate Bipolar Transistor (IGBT) circuit simulator models for soft-switching circuit conditions. The circuits used for the validation include a soft-switched boost converter similar to that
Allen R. Hefner Jr., Ranbir Singh, Jih-Sheng Lai, David W. Berning, Sebastien Bouche, Christophe C. Chapuy
The electrical performance of Silicon Carbide (SiC) diodes are evaluated and compared to commercially available Silicon (Si) diodes in the voltage range from 600 V through 5000 V. The comparisons include the on-state characteristics, the reverse recovery
This is a summary of recent exploratory efforts conducted by the American National Standards Institute (ANSI) Accredited Standards Committee C63, Sub-Committee 1,working group 1-13.2 on site requirements for radiated measurements above 1GHz. The main
The techniques for EMC measurements used with antennas above 1 GHz have been gleaned from methods used at lower frequencies. The assumptions made in applying these techniques have not been completely validated. This analysis will compare antennas for use
Curt A. Richter, Allen R. Hefner Jr., Eric M. Vogel
We have systematically compared the results of an extensive ensemble of the most advanced available quantum-mechanical capacitance-voltage simulation and analysis packages for a range of metal-oxide-semiconductor device parameters. While all have similar
Amanda N. Goyettes, Yicheng Wang, James K. Olthoff
Positive ion bombardment plays an essential role in plasma processing, influencing etch rates, materials selectivity and etching profiles. Experimental determination of ion identities and energies in processing plasmas provides complementary data necessary
A comprehensive and critical assessment of published data on the total, dissociative, and nondissociative electron attachment cross sections for SF 6 allowed us to recommend or suggest room temperature values for these cross sections over an energy range
The limited electron collision cross-section and transport-coefficient data for the plasma processing gas perfluorocyclobutane (c-C 4F 8) are synthesized, assessed, and discussed. These include cross sections for total electron scattering, differential
Allen R. Hefner Jr., David W. Berning, Jih-Sheng Lai, C Liu, Ranbir Singh
A newly developed Silicon Carbide (SiC) Merged PiN Schottky (MPS) diode combines the best features of both Schottky and PiN diodes to obtain low on-state voltage drop, low leakage in the off-state, fast switching, and good high temperature characteristics
Yicheng Wang, Martin Misakian, Amanda N. Goyettes, James K. Olthoff
We report ion energy distributions (IEDs), relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency (rf) reference cell for discharges generated in
Amanda N. Goyettes, Yicheng Wang, Martin Misakian, James K. Olthoff
Measurements of ion energy distributions relative ion intensities, and absolute total ion current densities were made at the grounded electrode of an inductively coupled Gaseous Electronics Conference (GEC) radio-frequency reference cell for discharges
This paper describes the application of microwave holography to infrared (IR) thermal images of electromagnetic (EM) fields for the purpose of measuring near-field radiation patterns of antennas. The phase of the field is retrieved from IR thermograms
Low-temperature plasma applications require detailed understanding of the physical and chemical processes occurring in the plasmas themselves. For instance, as the push for smaller feature sizes and higher quality devices in the semiconductor industry has
Elastic, inelastic, and superelastic scattering of electrons by and electron-impact ionization of excited atoms are reviewed and discussed and the role of the electric dipole polarizabilty in the interaction of slow electrons with excited atoms is
This article reports the results of time-resolved measurements of ion energy distributions (IEDs), relative ion densities, as well as optical emissions and electrical characteristics in pulsed, inductively coupled plasmas for the simple gas mixture of
Yicheng Wang, Amanda N. Goyettes, Martin Misakian, James K. Olthoff
We have determined the relative abundances and energy distributions of positive ions in high density plasmas generated in CHF 3, C 2F 6 and CH 2FCF 3 and their mixtures with Ar using an ion energy analyzer-mass spectrometer appended to the lower electrode
Amanda N. Goyettes, Yicheng Wang, James K. Olthoff
Many high density discharges used in microelectronics fabrication use fluorocarbon gases with coincidentally high global-warming potentials (GWPs). We have determined the identities, fluxes, and energy distributions of ions produced in high density
A software package for extracting parameters used in advanced IGBT models is presented. In addition, new model equations and extraction procedures are introduced that more accurately describe a wide range of IGBT types including the recently developed Warp
I address the issue of the definition and measurement of noise figure and parameters to characterize multiport devices, particularly differential amplifiers. A parameterization in terms of the noise matrix appears to be the most practical. The noise figure