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PUBLICATIONS

Mass-resolved Studies of Positive Ions in High Density Plasmas Generated in CHF3, C2F6, and CH2FCF3 and Their Mixtures with Ar

Published

Author(s)

Yicheng Wang, Amanda N. Goyettes, Martin Misakian, James K. Olthoff

Abstract

We have determined the relative abundances and energy distributions of positive ions in high density plasmas generated in CHF3, C2F6 and CH2FCF3 and their mixtures with Ar using an ion energy analyzer-mass spectrometer appended to the lower electrode of an inductively coupled GEC radio-frequency reference cell. CHF3 and C2F6, which are commonly used in plasma processing, possess high global warming potentials. CH2FCF3 , which is a popular refrigerant used in the air-conditioning industry, has a much lower global warming potential and may serve as a novel etching alternative. We find the ion composition and plasma characteristics of CH2FCF3 discharges to be similar to those for CHF3.
Proceedings Title
Proc. XIII International Conference on Gas Discharges and Their Applications
Conference Dates
September 3-8, 2000
Conference Location
Glasgow, 1, UK
Pub Type
Conferences

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Keywords

CHF<sub>3</sub>, C<sub>2</sub>F<sub>6</sub>, CH<sub>2</sub>FCF<sub>2</sub>, gas discharges , ion energy distributions
Electronics and Advanced communications

Citation

Wang, Y. , Goyettes, A. , Misakian, M. and Olthoff, J. (2000), Mass-resolved Studies of Positive Ions in High Density Plasmas Generated in CHF3, C2F6, and CH2FCF3 and Their Mixtures with Ar, Proc. XIII International Conference on Gas Discharges and Their Applications, Glasgow, 1, UK, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=11119 (Accessed October 1, 2025)

Issues

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Created August 31, 2000, Updated October 12, 2021
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