Mass-resolved Studies of Positive Ions in High Density Plasmas Generated in CHF3, C2F6, and CH2FCF3 and Their Mixtures with Ar

Published

September 1, 2000

Author(s)

Yicheng Wang, Amanda N. Goyettes, Martin Misakian, James K. Olthoff

Abstract

We have determined the relative abundances and energy distributions of positive ions in high density plasmas generated in CHF₃, C₂F₆ and CH₂FCF₃ and their mixtures with Ar using an ion energy analyzer-mass spectrometer appended to the lower electrode of an inductively coupled GEC radio-frequency reference cell. CHF₃ and C₂F₆, which are commonly used in plasma processing, possess high global warming potentials. CH₂FCF₃ , which is a popular refrigerant used in the air-conditioning industry, has a much lower global warming potential and may serve as a novel etching alternative. We find the ion composition and plasma characteristics of CH₂FCF₃ discharges to be similar to those for CHF₃.

Proceedings Title

Proc. XIII International Conference on Gas Discharges and Their Applications

Conference Dates

September 3-8, 2000

Conference Location

Glasgow, 1, UK

Pub Type

Conferences

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Keywords

CHF₃, C₂F₆, CH₂FCF₂, gas discharges , ion energy distributions

Citation

Wang, Y. , Goyettes, A. , Misakian, M. and Olthoff, J. (2000), Mass-resolved Studies of Positive Ions in High Density Plasmas Generated in CHF3, C2F6, and CH2FCF3 and Their Mixtures with Ar, Proc. XIII International Conference on Gas Discharges and Their Applications, Glasgow, 1, UK, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=11119 (Accessed October 24, 2025)