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Conferences

A Novel Wafer-plane Dosimeter for EUV Lithography

Author(s)
Steven E. Grantham, Charles S. Tarrio
Extreme Ultraviolet Lithography (EUVL) incorporates 13.5 nm light for patterning wafers and requires in-situ wafer-plane dosimetry that can be tailored to the...

Uncooled, Millimeter-Scale Atomic Magnetometers with Femtotesla Sensitivity

Author(s)
John E. Kitching, Svenja A. Knappe, William C. Griffith, Jan Preusser, V Gerginov, Peter D. Schwindt, Vishal Shah, Ricardo Jimenez Martinez
We summarize recent results at NIST to develop high-performance yet highly miniaturized magnetic sensors based on atomic vapors confined in microfabricated...

Creating a web-scale video collection for research

Author(s)
Paul D. Over, George M. Awad, Alan Smeaton, Colum Foley, James Lanagan
This paper begins by considering a number of important design questions for a web-scale, widely available, multimedia test collection intended to support long...

Towards a Global Interoperability Test Bed for eBusiness Systems

Author(s)
Nenad Ivezic, Hyunbo Cho, Jungyub Woo, Jun H. Shin, Jaewook Kim, Mohammad Abidi, Asuman Dogac, Tuncay Namli, Christine Legner, Francois Fischer
We describe an initial effort to create a comprehensive and coherent framework for feasibility analysis of the Global Interoperability Test Bed for eBusiness...

Fire Spread and Growth on Flexible Polyurethane Foam

Author(s)
William M. Pitts, Gregory Hasapis, Patrick Macatangga
A series of experiments designed to characterize fire spread and growth on flat samples of commercial non-fire-retarded flexible polyurethane foam have been...

An Analysis of CVSS Version 2 Vulnerability Scoring

Author(s)
Karen A. Scarfone, Peter M. Mell
The Common Vulnerability Scoring System (CVSS) is a specification that is used to measure the relative severity of software vulnerabilities. CVSS version 2...

Volume Estimation of Molded Artifacts by B-Splines

Author(s)
David E. Gilsinn, Bruce R. Borchardt, Amelia Tebbe
The volumes of two industrially molded non-metallic artifacts were estimated using surface data obtained by a coordinate measuring machine. A tensor product of...

Results of an international photomask linewidth comparison of NIST and PTB

Author(s)
Bernd Bodermann, Detleff Bergmann, Egbert Buhr, Wolfgang Haebler-Grohne, Harald Bosse, James E. Potzick, Ronald G. Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Ndubuisi George Orji
In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral...
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