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Results of an international photomask linewidth comparison of NIST and PTB

Published

Author(s)

Bernd Bodermann, Detleff Bergmann, Egbert Buhr, Wolfgang Haebler-Grohne, Harald Bosse, James E. Potzick, Ronald G. Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Ndubuisi George Orji

Abstract

In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This contribution reports on the current status of the bilateral comparison. In particular the methods for linewidth metrology applied at NIST and PTB and its major uncertainty contributions will be discussed based on actual measurements results for both of the mask standards chosen for the bilateral comparison.
Proceedings Title
SPIE Proceedings Vol. 7488
Volume
7488
Conference Dates
September 14-17, 2009
Conference Location
Monterey, CA, US
Conference Title
SPIE/BACUS Photomask Technology Conference 2009

Keywords

linewidth, CD metrology, uncertainty components, Nano1, international comparison, MRA, photomask

Citation

Bodermann, B. , Bergmann, D. , Buhr, E. , Haebler-Grohne, W. , Bosse, H. , Potzick, J. , Dixson, R. , Quintanilha, R. , Stocker, M. , Vladar, A. and Orji, N. (2009), Results of an international photomask linewidth comparison of NIST and PTB, SPIE Proceedings Vol. 7488, Monterey, CA, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=903776 (Accessed December 2, 2021)
Created October 8, 2009, Updated October 12, 2021