Yu, L.
, Cheung, K.
, Tilak, V.
, Dunne, G.
, Matocha, K.
, Campbell, J.
, Suehle, J.
and Sheng, K.
(2009),
Wafer-level Hall Measurement on SiC MOSFET, Silicon Carbide and Related Materials 2009, Nuremberg, -1, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905438
(Accessed October 15, 2024)