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Search Publications by: Ronald L. Jones (Fed)

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Displaying 26 - 50 of 149

Surface interaction parameter measurement of solvated polymers via model end-tethered chains

August 11, 2017
Author(s)
Richard J. Sheridan, Sara V. Orski, Ronald L. Jones, Sushil K. Satija, Kathryn L. Beers
We present a method for the direct measurement of the relative energy of interaction between a solvated polymer and a solid interface. By tethering linear chains covalently to the surface, we ensured the idealized and constant configuration of polymer

Spin-Analyzed SANS for Soft Matter Applications

June 20, 2017
Author(s)
WangChun Chen, John Barker, Ronald L. Jones, Kathryn Krycka, Shannon Watson, Cedric Victor Lucien Gagnon, T. Perevozchivoka, Paul Butler, Thomas R. Gentile
The small angle neutron scattering (SANS) of nearly Q-independent nuclear spin-incoherent scattering from hydrogen present in most soft matter and biology samples may raise an issue in structure determination in certain soft matter applications. This is

Reduction of Domain Spacing and Interfacial Width in Fast Ordering Nanofilled Copolymer Films by Direct Immersion Annealing

November 10, 2016
Author(s)
Melanie Longanecker, Arvind Modi, Andrey Dobrynin, Seyong Kim, Guangcui Yuan, Ronald L. Jones, Sushil K. Satija, Joona Bang, Alamgir Karim
Block copolymers (BCPs) offer a convenient templating method on the nanoscale to organize nanoparticles within a polymer film for the enhancement of various properties. For functional applications that require high nanoparticle loadings, this is often more

Critical Examination of the Colloidal Particle Model of Globular Proteins

February 3, 2015
Author(s)
Prasad S. Sarangapani, Steven D Hudson, Ronald L. Jones, Jack F. Douglas, Jai A. Pathak
Recent studies of globular protein solutions have uniformly adopted a colloidal view of proteins as particles, a perspective that neglects the polymeric primary structure of these biological macromolecules, their intrinsic flexibility and their ability to

Solvent Retention In Thin Spin-Coated Polystyrene And Poly(Methyl Methacrylate) Homopolymer Films Studied By Neutron Reflectometry

January 19, 2010
Author(s)
Xiaohua Zhang, Kevin G. Yager, Shuhui Kang, Nathaniel J. Fredin, Bulent Akgun, Sushil K. Satija, Jack F. Douglas, Alamgir Karim, Ronald L. Jones
We utilize neutron reflectometry (NR) to probe the amount of residual solvent inside thin polystyrene (PS) and poly(methyl methacrylate) (PMMA) films spin-coated from deuterated toluene polymer solutions onto silicon substrates . The effect of thermal

Application of Thermal Gradients to Achieve Orientational Order in Block Copolymer Thin Films

August 18, 2009
Author(s)
Nathaniel J. Fredin, Brian Berry, Kevin G. Yager, Alamgir Karim, Sushil K. Satija, Deanna Pickel, Ronald L. Jones
The development of methods that permit control over the long-range order and orientation of microdomains in block copolymer (BCP) thin films for bottom-up approaches to nanoscale surface patterning is of great interest for many applications, including

Line Width Roughness and Cross Sectional Measurements of Sub-50 nm Structures with CD-SAXS and CD-SEM

March 24, 2008
Author(s)
Chengqing C. Wang, Ronald L. Jones, Kwang-Woo Choi, Christopher L. Soles, Eric K. Lin, Wen-Li Wu, James S. Clarke, John S. Villarrubia, Benjamin Bunday
Critical dimension small angle x-ray scattering (CD-SAXS) is a measurement platform which is capable of measuring the average cross section and sidewall roughness in patterns ranging from (10 to 500) nm in pitch with sub nm precision. These capabilities

Block Copolymer Ordering With a Spatiotemporally Inhomogeneous Mobility

November 20, 2007
Author(s)
August W. Bosse, Jack F. Douglas, Brian Berry, Ronald L. Jones, Alamgir Karim
Motivated by recent measurements of zone annealing in block copolymer films at low temperatures, we implement a spatiotemporal mobility gradient with intrinsic variations associated with dynamic heterogeneities in the saddle point relaxation of a diblock

The Direct Patterning of Nanoporous Interlayer Dielectric Insulator Films by Nanoimprint Lithography

October 2, 2007
Author(s)
Hyun Wook Ro, Ronald L. Jones, H Peng, Daniel R. Hines, Hae-Jeong Lee, Eric K. Lin, Alamgir Karim, Do Y. Yoon, D Gidley, Christopher L. Soles
Directly patterning dielectric insulator materials via nanoimprint lithography has the potential to simplify fabrication processes and significantly reduce the manufacturing costs for semiconductor devices. However, the prospect of mechanically forming