Hu, T.
, Jones, R.
, Wu, W.
, Lin, E.
, Lin, Q.
, Keane, D.
, Weigand, S.
and Quintana, J.
(2004),
Small Angle X-Ray Scattering Metrology for Sidewall Angle and Cross Section of Nanometer Scale Line Gratings, Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852323
(Accessed December 15, 2024)
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Small Angle X-Ray Scattering Metrology for Sidewall Angle and Cross Section of Nanometer Scale Line Gratings
Published
Author(s)
, , , , Q Lin, D T. Keane, Steven Weigand, J Quintana
Citation
Journal of Applied Physics
Volume
96
Issue
No. 4
Pub Type
Journals
Download Paper
Keywords
lithography pattern, x-ray scattering
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created August 1, 2004, Updated February 17, 2017