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Small Angle X-Ray Scattering Metrology for Sidewall Angle and Cross Section of Nanometer Scale Line Gratings

Published

Author(s)

T Hu, Ronald L. Jones, Wen-Li Wu, Eric K. Lin, Q Lin, D T. Keane, Steven Weigand, J Quintana
Citation
Journal of Applied Physics
Volume
96
Issue
No. 4

Keywords

lithography pattern, x-ray scattering

Citation

Hu, T. , Jones, R. , Wu, W. , Lin, E. , Lin, Q. , Keane, D. , Weigand, S. and Quintana, J. (2004), Small Angle X-Ray Scattering Metrology for Sidewall Angle and Cross Section of Nanometer Scale Line Gratings, Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852323 (Accessed April 18, 2024)
Created August 1, 2004, Updated February 17, 2017