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Pattern Fidelity in Nanoimprinted Films Using Cd-Saxs

Published

Author(s)

Ronald L. Jones, Christopher L. Soles, Eric K. Lin, Walter Hu, R M. Reano, Stella W. Pang, Steven J. Weigand, D T. Keane, John P. Quintana
Conference Location
San Jose, CA.
Conference Title
Proceedings of the Spie 2005: Microlithography

Keywords

CD Metrology, Electronic Materials, Lithography, Mechanical Properties, Nanoimprint Lithography, Nanostructured Materials, Polymer Processing, Scattering, Thermal Properties, Thin Films, X-ray scattering, nanofabrication, nanotechnology

Citation

Jones, R. , Soles, C. , Lin, E. , Hu, W. , Reano, R. , Pang, S. , Weigand, S. , Keane, D. and Quintana, J. (2005), Pattern Fidelity in Nanoimprinted Films Using Cd-Saxs, Proceedings of the Spie 2005: Microlithography, San Jose, CA., [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853997 (Accessed April 12, 2024)
Created January 1, 2005, Updated February 17, 2017