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Search Publications by: Ronald L. Jones (Fed)

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Displaying 26 - 50 of 74

Polymer Viscoelasticity and Residual Stress Effects on Nanoimprint Lithography

May 24, 2007
Author(s)
Yifu Ding, Hyun Wook Ro, Jack F. Douglas, Ronald L. Jones, Daniel R. Hines, Alamgir Karim, Christopher L. Soles
We examine the influence of viscoelastic effects on the stability of nanoimprinted polymer films. The decay of features for polymers below the critical entanglement molecular mass at elevated temperatures is determined by simple surface tension and the

Environment-Controlled Spin Coating to Orient Microdomains in Thin Block Copolymer Films

March 20, 2007
Author(s)
Sangcheol Kim, R M. Briber, Alamgir Karim, Ronald L. Jones, H C. Kim
We demonstrate a simple and fast methodology to control the orientation of cylindrical microdomains in thin block copolymer films using environment-controlled spin coating. During spinning, the preferential affinity of vapor atmosphere successfully directs

Field-Induced Formation of Linear, Mesoscopic Polymer Chains From Ferromagnetic Nanoparticles

February 2, 2007
Author(s)
Jason Benkoski, Steven Bowles, Bryan Korth, Ronald L. Jones, Jack F. Douglas, Alamgir Karim, Jeffrey Pyun
Polymer-coated ferromagnetic colloids are first assembled with an applied magnetic field and then permanently fixed into one-dimensional mesostructures using a novel liquid-liquid interfacial system known as Fossilized Liquid Assembly. Using polystyrene

Line Edge Roughness Characterization of Sub-50nm Structures Using CD-SAXS: Round-Robin Benchmark Results

January 1, 2007
Author(s)
Chengqing C. Wang, J C. Roberts, Robert Bristol, B Bunday, Ronald L. Jones, Eric K. Lin, Wen-Li Wu, John S. Villarrubia, Kwang-Woo Choi, James S. Clarke, Bryan J. Rice, Michael Leeson
he need to characterize line edge and line width roughness in patterns with sub-50 nm critical dimension challenges existing platforms based on electron microscopy and optical scatterometry. The development of x-ray based metrology platforms provides a

Photocurable Oil/Water Interfaces as a Universal Platform for 2-D Self-Assembly

December 14, 2006
Author(s)
Jason Benkoski, Ronald L. Jones, Jack F. Douglas, Alamgir Karim
We present a novel platform for the creation of 2-D assemblies from nanoscale building blocks. The system consists of an oil/water interface in which the oil phase can be flash-cured upon UV exposure. The photopolymerizable material, 1,12-dodecanediol

Evidence for Internal Stresses Induced by Nanoimprint Lithography

November 30, 2006
Author(s)
Hyun Wook Ro, Yifu Ding, Hae-Jeong Lee, Daniel R. Hines, Ronald L. Jones, Eric K. Lin, Alamgir Karim, Wen-Li Wu, Christopher L. Soles
The thermal embossing form of nanoimprint lithography is used to pattern arrays of nanostructures into several different polymer films. The shape of the imprinted patterns is characterized with nm precision using both X-ray scattering and reflectivity

Advanced Metrology Needs for Nanoelectronics Lithography

October 1, 2006
Author(s)
Stephen Knight, Ronald Dixon, Ronald L. Jones, Eric Lin, Ndubuisi G. Orji, Richard M. Silver, Andras Vladar, Wen-li Wu
The semiconductor industry has exploited productivity improvements through aggressive feature size reduction for over four decades. While enormous effort has been expended in developing the optical lithography tools to print ever finer features

Real Time Shape Evolution of Nanoimprinted Polymer Structures During Thermal Annealing

July 18, 2006
Author(s)
Ronald L. Jones, T Hu, Christopher L. Soles, Eric K. Lin, R M. Reano, Stella W. Pang, D M. Casa
The real time shape of nanoimprinted polymer patterns are measured as a function of annealing temperature and time using a new metrology technique, Critical Dimension Small Angle X-ray Scattering (CD-SAXS). Periodicity, linewidth, line height, and sidewall

Effect of Initial Resist Thickness on Residual Layer Thickness of Nanoimprinted Structures

December 1, 2005
Author(s)
Hae-Jeong Lee, Hyun Wook Ro, Christopher L. Soles, Ronald L. Jones, Eric K. Lin, Wen-Li Wu, Daniel R. Hines
Accurate quantification and control of the residual layer thickness is a critical challenge to achieving sub-50 nm patterning with nanoimprint lithography. While characterization to within a few nanometers is essential, there is currently a lack of

Rheopexy of Synovial Fluid and Protein Aggregation

September 5, 2005
Author(s)
Katherine Oates, Wendy Krause, Ronald L. Jones, R H. Colby
Bovine synovial fluid and albumin solutions of similar concentration are rheopectic (stress increases with time in steady shear). This unusual flow characteristic is caused by protein aggrega- tion, and the total stress is enhanced by entanglement of this

X-ray Absorption Spectroscopy to Probe Surface Composition and Surface Deprotection in Photoresist Films

March 1, 2005
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A. Fischer, S Sambasivan, Eric K. Lin, Ronald L. Jones, Christopher Soles, Wen-Li Wu, D M. Goldfarb, M Angelopoulos
We utilize near edge x-ray absorption fine structure spectroscopy (NEXAFS) to provide chemical insight into surface chemical effects in model photo-resist films. First, NEXAFS was used to examine the resist/air interface including surface segregration of a

Formation of Deprotected Fuzzy Blobs in Chemically Amplified Resists

September 1, 2004
Author(s)
Ronald L. Jones, C G. Willson, T Hu, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, M Angelopoulos, B C. Trinque, G M. Schmidt, M D. Stewart
The requirement of nanometer dimensional control in photolithographic patterning underlies the future of emerging technologies including next generation semiconductors, nanofluidics, photonics, and microelectronic machines (MEMs). Dimensional control is

Correlation of the Reaction Front With Roughness in Chemically Amplified Photoresists

July 1, 2004
Author(s)
Ronald L. Jones, Vivek M. Prabhu, D M. Goldfarb, Eric K. Lin, Christopher L. Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, M Angelopoulos
A model bilayer geometry is used to examine fundamental contributions of in-situ reaction front profile width on resulting line edge roughness after development in standard 0.26 N tetramethyl ammonium hydroxide aqueous base developer. The bilayer geometry

Interfacial Effects on Moisture Absorption in Thin Polymer Films

June 1, 2004
Author(s)
B D. Vogt, Christopher L. Soles, Ronald L. Jones, C M. Wang, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, D L. Goldfarb, M Angelopoulos
Moisture absorption in model photoresist films of poly(4-hydroxystryene) (PHOSt) and poly(tert-butoxycarboxystyrene) (PBOCSt) was measured by x-ray and neutron reflectivity. The degree of swelling in the films upon moisture exposure was found to be

Unusual Expansion and Contraction in Ultrathin Glassy Polycarbonate Films

April 1, 2004
Author(s)
Christopher L. Soles, Jack F. Douglas, Ronald L. Jones, Wen-Li Wu
The thermal expansion behavior and glass transitions of poly(styrene) (PS) and poly(methyl methacrylate) (PMMA) are extensively studied in the thin film geometry. Both PS and PMMA are similar in that they possess very low entanglement densities. In this

Brillouin Scattering Studies of Polymeric Nanostructures

March 1, 2004
Author(s)
R Hartschuh, A Mahorowala, Y Ding, J H. Roh, A Kisliuk, Alexei Sokolov, Christopher Soles, Ronald L. Jones, T J. Hu, Wen-Li Wu
Polymers are now being patterned into nanometer-sized features via optical and/or imprint lithography for a range of applications, including semiconductors, Micro-Electro- Mechanical systems (MEMS), and Nano-Electro-Mechanical systems (NEMS). In these

Water Absorption in Thin Photoresist Films

February 1, 2004
Author(s)
B D. Vogt, Christopher L. Soles, Ronald L. Jones, Vivek M. Prabhu, Wen-Li Wu, Eric K. Lin
In this work, we quantify deviations in the moisture absorption into model photoresist films upon changing thickness. Both the thermodynamics and kinetics of the absorption process are examined. Water in the resist films has been shown to have a

Small Angle X-Ray Scattering for Sub-100 nm Pattern Characterization

November 1, 2003
Author(s)
Ronald L. Jones, T Hu, Eric K. Lin, Wen-Li Wu, R Kolb, D Casa, P J. Bolton, G G. Barclay
The characterization of sub-100 nm photolithographic patterns with nanometer scale resolution is demonstrated using Small Angle X-ray Scattering (SAXS). The transmission scattering geometry employed is capable of high throughput measurements with