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Search Publications by: Yicheng Wang (Fed)

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Displaying 26 - 50 of 139

Advanced Capacitance Metrology for Nanoelectronic Device Characterization

October 5, 2009
Author(s)
Curt A. Richter, Joseph J. Kopanski, Yicheng Wang, Muhammad Y. Afridi, Xiaoxiao Zhu, D. E. Ioannou, Qiliang Li, Chong Jiang
We designed and fabricated a test chip (consisting of an array of metal-oxide-semiconductor (MOS) capacitors and metal-insulator-metal (MIM) capacitors ranging from 0.3 fF to 1.2 pF) for use in evaluating the performance of new measurement approaches for

AC Power Standard Using a Programmable Josephson Voltage Standard

April 1, 2009
Author(s)
Bryan C. Waltrip, Bo Gong, Thomas L. Nelson, Yicheng Wang, Charles J. Burroughs, Alain Rufenacht, Samuel Benz, Paul Dresselhaus
This paper describes the implementation of a new quantum-based system for the generation of 120 V rms, 5 A rms, sinusoidal, active and reactive power over the 50 Hz to 400 Hz frequency range. The system accurately relates the spectral amplitudes and phases

Evaluation of a Capacitance Scaling System

December 1, 2007
Author(s)
Svetlana Avramov-Zamurovic, Andrew D. Koffman, Bryan C. Waltrip, Yicheng Wang
A capacitance scaling system from 10 nF to 100 mF [1], [2] has been implemented at the National Institute of Standards and Technology (NIST). Standard four-terminal-pair (4TP) capacitors are characterized using a capacitance scaling calibration procedure

Dissipation Factors of Fused-Silica Capacitors in the Audio Frequency Range

April 1, 2007
Author(s)
Yicheng Wang, Andrew D. Koffman, Gerald FitzPatrick
We describe dissipation factor measurements of 10 pF fused-silica capacitance standards from 50 Hz to 20 kHz, using a toroidal cross capacitor and a 10 pF nitrogen-filled capacitor as the references. The relative combined standard uncertainties are 0.56x10

An Upper Bound to the Frequency Dependence of the Cryogenic Vacuum-Gap Capacitor

September 6, 2006
Author(s)
Neil M. Zimmerman, Brian Simonds, Yicheng Wang
In attempting to develop a capacitance standard based on the charge of the electron, one question which has been open for many years is the frequency dependence of the vacuum-gap cryogenic capacitor. In this paper, we succeed in putting an upper bound on

A digitally programmable capacitance standard

April 1, 2004
Author(s)
Yicheng Wang, Lai H. Lee
We constructed a digitally programmable capacitance standard by modifying a commercial temperature-stabilized 100 pF capacitance standard which consists of 23 binary-weighted capacitor elements on a single fused-silica disk. The variable capacitor can be

Frequency dependence of capacitance standards

September 1, 2003
Author(s)
Yicheng Wang
We measured the frequency dependence of a 10 pF transportable fused-silica capacitor from 50 Hz to 20 kHz. The results have a relative standard uncertainty of 0.32x10^(-6), 0.15x10^(-6), and 0.37x10(-6) at 100 Hz, 400 Hz, and 20 kHz, respectively. This

Measurements of frequency dependence of fused-silica capacitors

August 1, 2003
Author(s)
Yicheng Wang
In order to improve the capacitance calibration services at the National Institute of Standards and Technology, we need to determine the frequency dependence of all the reference capacitance standards over the audio frequency range. The value of a standard

C 4 F 6 1,3 Hexafluorobutadiene - A New Etching Gas: Studies on Material Compatibility, Behavior in Inductively Coupled Plasma and Etch Processes Performance

June 1, 2003
Author(s)
A Nicoletti, P Srinivasan, M Riva, Eric C. Benck, A N. Goyette, Yicheng Wang, J M. Kim, P Hsieh, A Athayde, Abhay Joshi
Hexafluoro-1,3-butadiene (C 4F 6) is a relatively new etch gas for the manufacturing of semiconductor devices, especially in critical etch processes that need high aspect ratios and selectivity. It is able to combine very high performance with a benign