Ion Energy Distribution and Optical Measurements in High-Density, Inductively Coupled C4F6 Discharges

Published

August 1, 2003

Author(s)

Eric C. Benck, A N. Goyette, Yicheng Wang

Abstract

Hexafluoro-1,3 butadiene (C,F,) is a potential new etching gas for the manufacturing ol semiconductors which has a very low global warming potential, unlike commonly used fluorocarbon gases such as CF₄ and c-C₄F₈. We report ion energy distributions, relative ion intensities and absolute total ion current densities measured at the edge of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges Generated in pure C₄F₆ and C₄F₆:.Ar mixtures. In addition. the ratio of radical densities measured using submillimetter absorption spectroscopy and optical emission spectroscopy measurements are presented. These measurements of the C₄F₆ plasmas were made for several different gas pressures and gas mixture ratios.

Citation

Journal of Applied Physics

Volume

94

Issue

No. 3

Pub Type

Journals

Keywords

C₄F₆ fluorocarbon, GEC Reference Cell, inductively coupled plasma, mass-resolved ion energy distributions, optical emission spectroscopy, sub-millimeter absorption spectroscopy

Citation

Benck, E. , Goyette, A. and Wang, Y. (2003), Ion Energy Distribution and Optical Measurements in High-Density, Inductively Coupled C₄F₆ Discharges, Journal of Applied Physics (Accessed May 19, 2026)

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