Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Measurements of frequency dependence of fused-silica capacitors

Published

Author(s)

Yicheng Wang

Abstract

In order to improve the capacitance calibration services at the National Institute of Standards and Technology, we need to determine the frequency dependence of all the reference capacitance standards over the audio frequency range. The value of a standard capacitor may very slightly with frequency because the imperfect medium between its electrodes has varying degree of dielectric relaxation over the frequency range and the leads and electrodes of the capacitor have residual inductance. Using a combination of 1 pF cross capacitor that has negligible frequency dependence due to electrode surface films, and a 10 pF nitrogen dielectric capacitor with a very small residual inductance as references, we have measured the frequency dependence of two 10 pF transportable fused-silica capacitors from 50 Hz to 20 kHz. The results and the associated uncertainty analysis are discussed.
Conference Dates
August 17-21, 2003
Conference Location
Tampa, FL
Conference Title
NCSL International Workshop and Symposium

Keywords

calibration, capacitance, farad, frequency dependence, fused-silica capacitor, impedance, measurement, uncertainty

Citation

Wang, Y. (2003), Measurements of frequency dependence of fused-silica capacitors, NCSL International Workshop and Symposium, Tampa, FL, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=31333 (Accessed May 18, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created August 1, 2003, Updated January 27, 2020