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Rate Constants for Unimolecular Decomposition of SF6-

Published

Author(s)

Yicheng Wang, R. Champion, I. V. Dyakov, B. Peko

Abstract

Insulating gas mixtures containing SF6 have been promoted to serve as replacements for pure SF6 in order to reduce SF6 atmospheric emission. It has been argued that some synergism may be achieved by choosing proper buffer gases in mixtures with SF6 such that the buffer gases efficiently slow down electrons into an energy range where the electron attachment cross section for SF6 is large. A complete understanding of the dielectric properties of SF6 mixtures obviously requires information about electron detachment from SF6- as collisional electron detachment may be the principal source of discharge initiation in SF6 mixtures. In this paper, we report rate constants for collision-induced decomposition of SF6- modeled with a two-step mechanism in which collisional excitation of SF6- to SF6-* is followed by unimolecular decomposition of SF6-*. Unimolecular decomposition rates are based on recent thermochemical data and a statistical model first proposed by Klots [1]. The model results will be compared with the recently measured total cross sections for electron detachment and collision-induced dissociation for SF6- + N2. [1]. C.E. Klots, Chem. Phys. Lett. 38, 61 (1976).
Proceedings Title
Proc., Intl. Symp. on Gaseous Dielectrics
Conference Dates
May 21-25, 2001
Conference Location
Denver, CO, USA
Conference Title
9th International Symposium of Gaseous Dielectrics

Keywords

decomposition, negative ions, SF<sub>6</sub>, sulfur hexafluoride

Citation

Wang, Y. , Champion, R. , Dyakov, I. and Peko, B. (2001), Rate Constants for Unimolecular Decomposition of SF<sub>6</sub>-, Proc., Intl. Symp. on Gaseous Dielectrics, Denver, CO, USA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=17369 (Accessed April 15, 2024)
Created November 20, 2001, Updated October 12, 2021