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Search Publications by: Thomas B. Lucatorto (Assoc)

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Displaying 1 - 25 of 114

Measurements and model of UV-induced oxidation of aluminum

March 22, 2023
Robert F. Berg, Charles S. Tarrio, Thomas B. Lucatorto
We present measurements and a model of aluminum oxidation induced by ultraviolet (UV) radiation. Spots of oxide were grown by focusing synchrotron radiation onto a polycrystalline aluminum membrane in the presence of water vapor at pressures from 3×10-8

The hazard of UV-induced oxidation to solar-viewing spacecraft optics

March 2, 2023
Charles S. Tarrio, Robert F. Berg, Thomas B. Lucatorto, Dale E. Newbury, Nicholas Ritchie, Andrew Jones, Frank Eparvier
The two most prevalent outgas contaminants on satellites are organic molecules and water vapor. Adsorbed organic molecules can degrade a solar-viewing instrument when they are cracked by ultraviolet radiation (UV) and become a light-absorbing layer of

Evidence Against Carbonization of the Thin-Film Filters of the Extreme Ultraviolet Variability Experiment onboard the Solar Dynamics Observatory

April 1, 2021
Charles Tarrio, Robert F. Berg, Thomas B. Lucatorto, Andrew Jones, Frank Eparvier, Brian Templeman, Donald Woodraska, Marie Dominique
In spite of strict limits on outgassing from organic materials, some spacecraft instruments making long-term measurements of solar extreme ultraviolet (EUV) radiation still suff er signi cant degradation. While such measures have reduced the rate of

Thermally stable thin-film filters for high-power extreme-ultraviolet applications

November 12, 2015
Charles S. Tarrio, Robert F. Berg, Thomas B. Lucatorto, Bruce Lairson, Heidi Lopez, Travis Ayers
We investigated several types of thin-film filters for high intensity work in the extreme-ultraviolet (EUV) spectral range. In our application, with a peak EUV intensity of 2.7 W cm-2, Ni-mesh-backed Zr filters have a typical lifetime of 20 hours, at which

Improved measurement capabilities at the NIST EUV Reflectometry Facility

August 1, 2014
Charles S. Tarrio, Steven E. Grantham, Thomas A. Germer, Jack C. Rife, Thomas B. Lucatorto, Mike Kriese, Yuriy Platonov, Licai Jiang, Jim Rodriguez
The NIST Extreme Ultraviolet (EUV) Reflectometry Facility was designed in the 1990s to accommodate the largest multilayer optics envisioned at that time. However, with increasing power requirements for an EUV scanner, source collection optics have grown

EUV-Driven Carbonaceous Film Deposition and Its Photo-oxidation on a TiO2 Film Surface

September 23, 2013
Nadir S. Faradzhev, Monica McEntee, John Yate, Shannon B. Hill, Thomas B. Lucatorto
We report the photo-deposition of a carbonaceous layer grown on a TiO2 thin film by EUV radiation-induced chemistry of adsorbed n-tetradecane and the subsequent photo-oxidation of this film. It is found by chemical analysis of the C layer that irradiation

A synchrotron beamline for extreme-ultraviolet photoresist testing

September 30, 2011
Charles S. Tarrio, Steven E. Grantham, Shannon B. Hill, Nadir S. Faradzhev, Lee J. Richter, Chester Knurek, Thomas B. Lucatorto
Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be evaluated for sensitivity and tested to ensure that they will not contaminate the scanner optics. The new NIST facility described here provides data on the contamination

SURF III: A flexible Synchrotron Radiation Source for Radiometry and Research

September 1, 2011
Uwe Arp, Charles W. Clark, Lu Deng, Nadir S. Faradzhev, Alex P. Farrell, Mitchell L. Furst, Steven E. Grantham, Edward W. Hagley, Shannon B. Hill, Thomas B. Lucatorto, Ping-Shine Shaw, Charles S. Tarrio, Robert E. Vest
The calculability of synchrotron radiation (SR) makes electron storage rings wonderful light sources for radiometry. The broadband nature of SR allows coverage of the whole spectral region from the x-ray to the far-infrared. Compact low-energy storage

Optics contamination studies in support of high-throughput EUV lithography tools

March 25, 2011
Shannon B. Hill, Fardina Asikin, Lee J. Richter, Steven E. Grantham, Charles S. Tarrio, Thomas B. Lucatorto, Sergiy Yulin, Mark Schurmann, Viatcheslav Nesterenko, Torsten Feigl
We report on optics contamination rates induced by exposure to broad-bandwidth, high-intensity EUV radiation peaked near 8 nm in a new beamline at the NIST synchrotron. The peak intensity of 50 mW/mm2 allows extension of previous investigations of

Measuring the EUV-induced contamination rates of TiO2-capped multilayer optics by anticipated production-environment hydrocarbons

October 1, 2009
Shannon B. Hill, Nadir S. Faradzhev, Charles S. Tarrio, Thomas B. Lucatorto, Robert A. Bartynski, B. V. Yakshinskiy, T. E. Madey
The primary, publicly reported cause of optic degradation in pre-production extreme-ultraviolet (EUV) lithography systems is carbon deposition. This results when volatile organics adsorb onto optic surfaces and then are cracked by EUV-induced reactions

Tracking down sources of carbon contamination in EUVL exposure tools

August 3, 2009
Charles S. Tarrio, Robert E. Vest, Thomas B. Lucatorto, R. Caudillo
Optics in EUVL exposure tools are known to suffer reflectivity degradation, mostly from the buildup of carbon. The sources of this carbon have been difficult to identify. Vacuum cleanliness is normally monitored with a residual gas analyzer, but this has

At-Wavelength Metrology for EUV Lithography at NIST

July 14, 2009
Charles S. Tarrio, Steven E. Grantham, Robert E. Vest, Thomas B. Lucatorto
The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mirror

EUVL dosimetry at NIST

March 13, 2009
Charles S. Tarrio, Steven E. Grantham, Marc J. Cangemi, Robert E. Vest, Thomas B. Lucatorto, Noreen Harned
As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three extreme

Accelerated Lifetime Metrology of EUV Multilayer Mirrors in Hydrocarbon Environments

October 1, 2008
Shannon B. Hill, Nadir S. Faradzhev, Charles S. Tarrio, Thomas B. Lucatorto, T. E. Madey, B. V. Yakshinskiy, E. Loginova, S. Yulin
The ability to predict the rate of reflectivity loss of capped multilayer mirrors (MLMs) under various conditions of ambient vacuum composition, intensity, and previous dose is crucial to solving the mirror lifetime problem in an EUV stepper. Previous

Quantitative Measurement of Outgas Products From EUV Photoresists

March 14, 2008
Charles S. Tarrio, Bruce A. Benner Jr, Robert E. Vest, Steven E. Grantham, Shannon B. Hill, Thomas B. Lucatorto, Jay H. Hendricks, Patrick J. Abbott, Greg Denbeaux, Alin Antohe, Chimaobi Mbanaso, Kevin Orbek
The photon-stimulated emission of organic molecules from the photoresist during exposure is a serious problem for extreme- ultraviolet lithography (EUVL) because the adsorption of the outgassing products on the EUV optics can lead to carbonization and

Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography

September 1, 2006
M Nieto, J P. Allain, V Titov, M R. Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles Tarrio, Yaniv Barad, Steven Grantham, Thomas B. Lucatorto, Bryan Rice
The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To study