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At-Wavelength Metrology for EUV Lithography at NIST
Published
Author(s)
Charles S. Tarrio, Steven E. Grantham, Robert E. Vest, Thomas B. Lucatorto
Abstract
The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mirror endurance testing.
Citation
International Extreme Ultraviolet Lithography Symposium
Tarrio, C.
, Grantham, S.
, Vest, R.
and Lucatorto, T.
(2009),
At-Wavelength Metrology for EUV Lithography at NIST, International Extreme Ultraviolet Lithography Symposium
(Accessed September 21, 2023)