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At-Wavelength Metrology for EUV Lithography at NIST

Published

Author(s)

Charles S. Tarrio, Steven E. Grantham, Robert E. Vest, Thomas B. Lucatorto

Abstract

The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mirror endurance testing.
Citation
International Extreme Ultraviolet Lithography Symposium

Keywords

endurance testing, environmental testing, extreme ultraviolet, lithography, radiometry, reflectometry

Citation

Tarrio, C. , Grantham, S. , Vest, R. and Lucatorto, T. (2009), At-Wavelength Metrology for EUV Lithography at NIST, International Extreme Ultraviolet Lithography Symposium (Accessed July 5, 2022)
Created July 14, 2009, Updated February 17, 2017