Tarrio, C.
, Grantham, S.
, Vest, R.
and Lucatorto, T.
(2009),
At-Wavelength Metrology for EUV Lithography at NIST, International Extreme Ultraviolet Lithography Symposium (Accessed October 8, 2026)
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At-Wavelength Metrology for EUV Lithography at NIST
Published
Author(s)
, , ,
Abstract
The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mirror endurance testing.Citation
International Extreme Ultraviolet Lithography Symposium
Pub Type
Journals
Keywords
endurance testing, environmental testing, extreme ultraviolet, lithography, radiometry, reflectometry
Citation
Issues
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Created July 14, 2009, Updated February 17, 2017