Tracking down sources of carbon contamination in EUVL exposure tools
Charles S. Tarrio, Robert E. Vest, Thomas B. Lucatorto, R. Caudillo
Optics in EUVL exposure tools are known to suffer reflectivity degradation, mostly from the buildup of carbon. The sources of this carbon have been difficult to identify. Vacuum cleanliness is normally monitored with a residual gas analyzer, but this has not shown carbon-containing species in sufficient concentration to account for the observed carbon buildup. We have developed a technique based on cryo trapping followed by gas chromatography with mass spectrometry analysis that is more sensitive to less-volatile compounds. We will present sample data on model systems as well as a preliminary analysis of a micro-exposure tool.
Proceedings of SPIE, Vol. 7271, Alternative Lithographic Technologies
, Vest, R.
, Lucatorto, T.
and Caudillo, R.
Tracking down sources of carbon contamination in EUVL exposure tools, Proceedings of SPIE, Vol. 7271, Alternative Lithographic Technologies, San Jose, CA
(Accessed December 4, 2023)