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Polymer Photochemistry at the EUV Wavelength

Published

Author(s)

Charles S. Tarrio, Theodore Fedynyshyn, Russell Goodman, Alberto Cabral, Thomas B. Lucatorto
Proceedings Title
Proc. SPIE, vol. 7639
Conference Dates
January 17-21, 2010
Conference Location
San Jose, CA
Conference Title
Advances in Resist Materials and Processing Technology XXVII

Keywords

EUV lithography, photoresist, polymer chemistry

Citation

Tarrio, C. , Fedynyshyn, T. , Goodman, R. , Cabral, A. and Lucatorto, T. (2010), Polymer Photochemistry at the EUV Wavelength, Proc. SPIE, vol. 7639, San Jose, CA, [online], https://doi.org/10.1117/12.845997 (Accessed July 6, 2022)
Created June 8, 2010, Updated November 10, 2018