Tarrio, C.
, Fedynyshyn, T.
, Goodman, R.
, Cabral, A.
and Lucatorto, T.
(2010),
Polymer Photochemistry at the EUV Wavelength, Proc. SPIE, vol. 7639, San Jose, CA, [online], https://doi.org/10.1117/12.845997
(Accessed December 1, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Polymer Photochemistry at the EUV Wavelength
Published
Author(s)
, Theodore Fedynyshyn, Russell Goodman, Alberto Cabral,
Proceedings Title
Proc. SPIE, vol. 7639
Conference Dates
January 17-21, 2010
Conference Location
San Jose, CA
Conference Title
Advances in Resist Materials and Processing Technology XXVII
Pub Type
Conferences
Download Paper
Keywords
EUV lithography, photoresist, polymer chemistry
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created June 8, 2010, Updated November 10, 2018