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PUBLICATIONS

Polymer Photochemistry at the EUV Wavelength

Published

Author(s)

Charles S. Tarrio, Theodore Fedynyshyn, Russell Goodman, Alberto Cabral, Thomas B. Lucatorto
Proceedings Title
Proc. SPIE, vol. 7639
Conference Dates
January 17-21, 2010
Conference Location
San Jose, CA
Conference Title
Advances in Resist Materials and Processing Technology XXVII
Pub Type
Conferences

Download Paper

https://doi.org/10.1117/12.845997

Keywords

EUV lithography, photoresist, polymer chemistry
Physics and Optical physics and communications

Citation

Tarrio, C. , Fedynyshyn, T. , Goodman, R. , Cabral, A. and Lucatorto, T. (2010), Polymer Photochemistry at the EUV Wavelength, Proc. SPIE, vol. 7639, San Jose, CA, [online], https://doi.org/10.1117/12.845997 (Accessed October 28, 2025)

Issues

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Created June 8, 2010, Updated November 10, 2018
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