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Displaying 1776 - 1800 of 2183

Molecular Measuring Machine Design and Measurements

May 1, 2000
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
We at the National Institute of Standards and Technology are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing nanometer-accuracy, two-dimensional, point-to-point measurements over a 50 mm by 50 mm area

SEM Sentinel - SEM Performance Measurement System, Part 1

April 1, 2000
Author(s)
Alice V. Ling, Andras Vladar, Bradley N. Damazo, M A. Donmez, Michael T. Postek
This report describes the current design of a system for monitoring the performance of several major subsystems of a scanning electron microscope (SEM). The following subsystems and the associated functional parameters will be monitored. 1) Vacuum system

An Overview of Nano-Micro-Meso Scale Manufacturing at the NIST

March 13, 2000
Author(s)
E Amatucci, Nicholas Dagalakis, Bradley N. Damazo, Matthew A. Davies, John Evans, Jun-Feng Song, E C. Teague, Theodore V. Vorburger
The future of nano-, micro- and meso-scale manufacturing operations will be strongly influenced by a new breed of assembly and manufacturing tools that will be intelligent, flexible, more precise, include in-process production technologies and make use of

A Frequency Stabilized Laser Array for Use in Displacement Metrology

February 17, 2000
Author(s)
J Pedulla, R Deslattes, John R. Lawall
We have developed a frequency stabilized laser system to supply light to measure atomic-scale displacements of a stage moved in real time. Each laser in the array provides enough power (~1 mW) for four Michelson interferometers whose accuracy requires a

Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version)

January 31, 2000
Author(s)
J Allgair, C Archie, W Banke, H Bogardus, A Delaporte, Michael T. Postek, J Schlesinger, B Singh, Andras Vladar, A Yanof
The Advanced Metrology Advisory Group (AMAG) comprised of representatives from: the International SEMATECH (ISEMATECH) consortium member companies; the National Institute of Standards and Technology; and ISEMATECH assignees have joined to develop a unified

A Fast Algorithm for Determining the Gaussian Filter Mean Line in Surface Metrology

January 1, 2000
Author(s)
Y B. Yuan, X F. Qiang, Jun-Feng Song, Theodore V. Vorburger
A fast algorithm for assessing the Gaussian filtered mean line was deduced using the central limit theorem and an approximation method. This algorithm only uses simple computer operations such as addition, subtraction and digit shifting, and avoids

A Novel Artifact for Testing Large Coordinate Measuring Machines

January 1, 2000
Author(s)
Steven D. Phillips, Daniel S. Sawyer, Bruce R. Borchardt, David E. Ward, D E. Beutel
We present a high accuracy artifact useful for the evaluation of large CMMs. This artifact can be physically probed by the CMM in contrast to conventional techniques that use purely optical methods such as laser interferometers. The system can be used over

A Simplified Realization for the Gaussian Filter in Surface Metrology

January 1, 2000
Author(s)
Y B. Yuan, Theodore V. Vorburger, Jun-Feng Song, Thomas B. Renegar
A simplified realization for the Gaussian filter in surface metrology is presented in this paper. The sampling function sinu/u is used for simplifying the Gaussian function. According to the central limit theorem, when n approaches infinity, the function

An Analysis of Existing Ontological Systems for Applications in Manufacturing

January 1, 2000
Author(s)
Craig I. Schlenoff, Peter O. Denno, Robert W. Ivester, Simon Szykman, Don E. Libes
The objective of this work described in this paper is to move closer to the ultimate goal of seamless system integration using the principle behind ontological engineering to unambiguously define domain-specific concepts. Current integration efforts are

An Overview of Nano-Micro-Meso Scale Manufacturing at NIST

January 1, 2000
Author(s)
E C. Teague, Jun-Feng Song, Bradley N. Damazo, John Evans, Matthew A. Davies, Nicholas G. Dagalakis
The Manufacturing Engineering Laboratory (MEL) has a unique mission of discrete part manufacturing technology within the National Institute of Standards and Technology''s (NIST) mission of measurement, standards, data and infrastructure technology. Several

Angular Distribution of Light Scattered From a Sinusoidal Grating

January 1, 2000
Author(s)
Egon Marx, Thomas A. Germer, Theodore V. Vorburger, B C. Park
The angular distributions of light scattered by gold-coated and aluminum-coated gratings having amplitudes of ~90 nm and periods of 6.67 ¿m were measured and calculated for light incident from a HeNe laser at an angle of 6E. Experimental results are

Computation of Light Scattered Into Detector

January 1, 2000
Author(s)
Egon Marx
To compare the measured bidirectional reflectance distribution function (BRDF) of a rough surface to the results of a computation, we have to take into account the aperture of the detector and, more generally, the properties of the measuring instrument. We

Density Variations in Scanned Probe Oxidation

January 1, 2000
Author(s)
K Morimoto, F Perez-murano, John A. Dagata
The density of oxide nanostructures produced by scanned probe microscopy (SPM) is a function of substrate doping and voltage-pulse parameters. The total oxide thickness and molar-volume ratio of SPM oxide, obtained from high-resolution cross-sectional

Experimental Test of Blind Tip Reconstruction for Scanning Probe Microscopy

January 1, 2000
Author(s)
Samuel Dongmo, John S. Villarrubia, Samuel N. Jones, Thomas B. Renegar, Michael T. Postek, Jun-Feng Song
Determination of the tip geometry is a prerequisite to converting the scanning probe microscope (SPM) from a simple imaging instrument to a tool that can perform width measurements accurately. Recently we developed blind reconstruction, a method to

Nanoindentation of Polymers: Tip Shape Calibration and Uncertainty Issues

January 1, 2000
Author(s)
Mark R. VanLandingham, John S. Villarrubia, G Meyers
Indentation measurements made with atomic force microscopy (AFM) probes are relative measurements, largely due to the lack of information regarding the tip shape of the AFM probes. Also, current tip shape calibration procedures used in depth-sensing

NIST Random Profile Roughness Specimens and Standard Bullets

January 1, 2000
Author(s)
Jun-Feng Song, Theodore V. Vorburger, Robert A. Clary, Michael L. McGlauflin, Eric P. Whitenton, Christopher J. Evans
Based on the numerical controlled (NC) diamond turning process used previously for manufacturing random profile roughness specimens, two prototype standard bullets were developed at the National Institute of Standards and Technology (NIST). These standard
Displaying 1776 - 1800 of 2183
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