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PUBLICATIONS

A Novel Artifact for Testing Large Coordinate Measuring Machines

Published

Author(s)

Steven D. Phillips, Daniel S. Sawyer, Bruce R. Borchardt, David E. Ward, D E. Beutel

Abstract

We present a high accuracy artifact useful for the evaluation of large CMMs. This artifact can be physically probed by the CMM in contrast to conventional techniques that use purely optical methods such as laser interferometers. The system can be used over large distances, e.g. over four meters, with an uncertainty of less than one part per million. The artifact is relatively inexpensive, robust for use in reasonable industrial environments, and significantly reduces testing time over traditional step gauge measurements.
Conference Dates
October 1, 2001
Conference Title
Proceedings of the American Society for Precision Engineering
Pub Type
Conferences

Keywords

CMM, interferometry, laser, step gauge
Manufacturing and Metrology

Citation

Phillips, S. , Sawyer, D. , Borchardt, B. , Ward, D. and Beutel, D. (2000), A Novel Artifact for Testing Large Coordinate Measuring Machines, Proceedings of the American Society for Precision Engineering (Accessed September 9, 2024)

Issues

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Created January 1, 2000, Updated February 19, 2017