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Final Report: 1998-1999 NIST/SEMATECH Project on Intercomparison of Linewidth Measurement Methods

Published

Author(s)

John S. Villarrubia, Ronald G. Dixson, Samuel N. Jones, J R. Lowney, Michael T. Postek

Abstract

Abstract unavailable.
Citation
Transfer Document; NIST/SEMATECH Proprietary

Keywords

atomic force microscopy (AFM), critical dimension (CD), electrical critical dimension (ECD), linewidth metrology, scanning electron microscopy (SEM)

Citation

Villarrubia, J. , Dixson, R. , Jones, S. , Lowney, J. and Postek, M. (2000), Final Report: 1998-1999 NIST/SEMATECH Project on Intercomparison of Linewidth Measurement Methods, Transfer Document; NIST/SEMATECH Proprietary (Accessed May 25, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2000, Updated February 19, 2017