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Nanotechnology

Nanometrology

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Displaying 701 - 725 of 855

The Limits and Extensibility of Optical Patterned Defect Inspection

April 1, 2010
Author(s)
Richard M. Silver, Bryan M. Barnes, Martin Y. Sohn, Richard Quintanilha, Hui Zhou, Chris Deeb, Mark Johnson, Milton Goodwin, Dilip Patel
New techniques recently developed at the National Institute of Standards and Technology using bright field optical tools are applied to signal-based defect analysis of features with dimensions well below the measurement wavelength. A key to this approach

Calibration of 1 nm SiC Step Height Standards

March 31, 2010
Author(s)
Theodore V. Vorburger, Albert M. Hilton, Ronald G. Dixson, Ndubuisi G. Orji, J. A. Powell, A. J. Trunek, P. G. Neudeck, P. B. Abel
We aim to develop and calibrate a set of step height standards to meet the range of steps useful for nanotechnology. Of particular interest to this community is the calibration of atomic force microscopes operating at their highest levels of magnification

Proximity-associated errors in contour metrology

March 31, 2010
Author(s)
John S. Villarrubia, Ronald G. Dixson, Andras Vladar
In contour metrology the CD-SEM (critical dimension scanning electron microscope) assigns a continuous boundary to extended features in an image. The boundary is typically assigned as a simple function of the signal intensity, for example by a brightness

Characterization of Soluble Anthradithiophene Derivatives

March 18, 2010
Author(s)
Brad Conrad, Calvin Chan, Marsha A. Loth, John E. Anthony, David J. Gundlach
We will discuss the growth and electrical measurements of a newly developed, partially fluorinated anthradithiophene (F-ADT) derivative with tert-butyldiphenylsilyl (TBDMS) side groups. Single crystals of the material can be readily grown and device hole

Flip Chip Lamination Approach to Fabricate Top Metal Contacts on Organic-based Devices

March 15, 2010
Author(s)
Mariona Coll Bau, Oana Jurchescu, Nadine Gergel-Hackett, Curt A. Richter, Christina Hacker
Flip Chip Lamination approach to fabricate top metal contacts on organic-based devices ; M.Coll, O.D. Jurchescu, N. Gergel-Hackett, C.A. Richter, C,A, Hacker, American Physical Society (APS), March 2010, Portland, OR, USA (oral)

Nanomechanical Measurements and Tools

February 23, 2010
Author(s)
Robert F. Cook
Nanotechnology provides great opportunities for the development of advanced devices with enormous quality-of-life and economic benefits, with applications ranging from biomedical implantable actuators to environmental toxin detectors to infrastructural

Steady-state and transient photoconductivity in c-axis GaN nanowires grown by nitrogen-plasma-assisted molecular beam epitaxy

February 12, 2010
Author(s)
Norman A. Sanford, Paul T. Blanchard, Kristine A. Bertness, Lorelle Mansfield, John B. Schlager, Aric W. Sanders, Alexana Roshko, Beau Burton, Steven George
Analysis of steady-state and transient photoconductivity measurements at room temperature performed on c-axis oriented GaN nanowires yielded estimates of free carrier concentration, drift, mobility, surface band bending, and surface capture coefficient for

Elastic constants and dimensions of imprinted polymeric nanolines determined from Brillouin light scattering

January 18, 2010
Author(s)
Ward L. Johnson, Sudook A. Kim, Roy H. Geiss, Colm Flannery, Paul R. Heyliger, Christopher L. Soles, Wen-Li Wu, Chengqing C. Wang, Christopher M. Stafford, B D. Vogt
Elastic constants and cross-sectional dimensions of imprinted nanolines of poly(methyl methacrylate) (PMMA) on silicon are determined nondestructively from finite-element inversion analysis of dispersion curves of hypersonic acoustic modes of these

Nanoscale Measurements With the TSOM Optical Method

January 4, 2010
Author(s)
Ravikiran Attota
A novel through-focus scanning optical microscope (TSOM - pronounced as 'tee-som') technique that produces nanometer dimensional measurement sensitivity using a conventional optical microscope by analyzing images obtained at different focus positions will

Accurate optical analysis of single molecule entrapment in nanoscale vesicles

January 1, 2010
Author(s)
Joseph E. Reiner, Andreas Jahn, Samuel M. Stavis, Michael J. Culbertson, Wyatt N. Vreeland, Daniel L. Burden, Jon C. Geist, Michael Gaitan
We present a non-destructive method to characterize low analyte concentrations in nanometer scale lipid vesicle formulations. Our method is based on the application of fluorescence fluctuation analysis (FFA) and multi-angle laser light scattering (MALLS)

Traceability: The Key to Nanomanufacturing

December 30, 2009
Author(s)
Ndubuisi George Orji, Ronald G. Dixson, Bryan Barnes, Richard M. Silver
Over the last few years key advances have been made in the area of nanomanufacturing and nanofabrication. Several researchers have produced nanostructures using either top-down or bottom-up techniques, while other groups have functionalized such structures
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