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Nanotechnology

Nanometrology

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Displaying 551 - 575 of 855

Three-dimensional real-time tracking of nanoparticles at an oil-water interface

June 5, 2012
Author(s)
Kan K. Du, James A. Liddle, Andrew J. Berglund
We show that real-time feedback control can be used to study three-dimensional nanoparticle transport dynamics. We apply the method to study the behavior of adsorbed nanoparticles at a silicone oil-water interface in a microemulsion system over a range of

Nanoparticle Size and Shape Evaluation Using the TSOM Method

June 1, 2012
Author(s)
Bradley N. Damazo, Ravikiran Attota, Premsagar P. Kavuri, Andras Vladar
A novel through-focus scanning optical microscopy (TSOM) method that yields nanoscale information from optical images obtained at multiple focal planes will be used here for nanoparticle dimensional analysis. The TSOM method can distinguish not only size

Ultimate bending strength of Si nanowires

April 11, 2012
Author(s)
Gheorghe Stan, Sergiy Krylyuk, Albert Davydov, Igor Levin, Robert F. Cook
Test platforms for the ideal strength of materials are provided by almost defect-free nanostructures (nanowires, nanotubes, nanoparticles, for example). In this work, the ultimate bending strengths of Si nanowires with radii in the 20 nm to 60 nm range

Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node

April 10, 2012
Author(s)
Ravikiran Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several through

Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography

April 10, 2012
Author(s)
Ravikiran Attota, Shrawan Singhal, Sreenivasan S.V.
Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist underneath

Contour Metrology using Critical Dimension Atomic Force Microscopy

April 9, 2012
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson, Andras Vladar, Bin Ming, Michael T. Postek
The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is

Scatterfield Microscopy of 22 nm Node Patterned Defects using Visible and DUV Light

April 4, 2012
Author(s)
Bryan M. Barnes, Martin Y. Sohn, Francois R. Goasmat, Hui Zhou, Richard M. Silver, Abraham Arceo
Smaller patterning dimensions and novel architectures are fostering research into improved methods of defect detection in semiconductor device manufacturing. This initial experimental study, augmented with simulation, evaluates scatterfield microscopy to

SEM imaging of ultra-high aspect ratio hole features

March 29, 2012
Author(s)
John S. Villarrubia, Aron Cepler, Benjamin D. Bunday, Bradley Thiel
In-line, non-destructive process control metrology of high aspect ratio (HAR) holes and trenches has long been a known gap in metrology. Imaging the bottoms of at-node size beyond 10:1 AR contact holes in oxide has not yet been demonstrated. Nevertheless

Tumor Necrosis Factor Interaction with Gold Nanoparticles

March 14, 2012
Author(s)
De-Hao D. Tsai, Sherrie R. Elzey, Frank W. DelRio, Robert I. MacCuspie, Suvajyoti S. Guha, Michael R. Zachariah, Athena M. Keene, Jeffrey D. Clogston, Vincent A. Hackley
We report on a systematic investigation of molecular conjugation of tumor necrosis factor protein-α (TNF) onto gold nanoparticles (AuNPs) and the subsequent binding behavior to its antibody (anti-TNF). We employ a combination of physical and spectroscopic

Electrospray Differential Mobility Analysis as an Orthogonal Tool to Size Exclusion Chromatography for Characterization of Protein Aggregates

March 12, 2012
Author(s)
Suvajyoti S. Guha, Joshua R. Wayment, Michael J. Tarlov, Michael R. Zachariah
The biopharmaceutical industry characterizes and quantifies aggregation of protein therapeutics using multiple analytical techniques to cross validate results. Here we demonstrate the use of electrospray-differential mobility analysis (ES-DMA), a gas-phase

Optical microscope angular illumination analysis

March 7, 2012
Author(s)
Ravikiran Attota
For high precision applications of optical microscopes, it is critical to achieve symmetrical angular illumination intensity at the sample plane, in addition to uniform spatial intensity achieved by Köhler illumination. In this paper, first we demonstrate

Transmission EBSD from 10 nm domains in a scanning electron microscope

March 1, 2012
Author(s)
Robert R. Keller, Roy H. Geiss
The spatial resolution of electron diffraction within the scanning electron microscope (SEM) has progressed from channelling methods capable of measuring crystallographic characteristics from 10 μm regions to electron backscatter diffraction (EBSD) methods

VCI Simulation with Semiconductor Device Models: Test Report

February 29, 2012
Author(s)
John S. Villarrubia
JMONSEL, an electron beam imaging simulator, has been modified to permit conducting regions of a sample to be designated as unconnected to an external source or sink of charge (floating) or, alternatively, to be connected with a user-specified relaxation

Quantification of ligand packing density on gold nanoparticles using ICP-OES

February 18, 2012
Author(s)
Sherrie R. Elzey, De-Hao D. Tsai, Savelas A. Rabb, Lee L. Yu, Michael R. Winchester, Vincent A. Hackley
In this study, a prototypical thiolated organic ligand, 3-mercaptopropionic acid (MPA), was conjugated on gold nanoparticles (AuNPs), and packing density was measured on an ensemble-averaged basis using inductively coupled plasma optical emission

Direct observation of nucleation and early stages of growth of GaN nanowires

February 15, 2012
Author(s)
Rosa E. Diaz, Renu Sharma, Karalee Jarvis, Qinglei Zhang, Subhash Mahajan
We report for the first time direct observations of the nucleation and early stages of growth of GaN nanowires. The nanowires were formed by exposing Au + Ga droplets to ammonia. The formation process was observed in situ, and controlled in real time using

Formation and structure of 360 and 540 degree domain walls in thin magnetic stripes

February 10, 2012
Author(s)
Youngman Jang, Samuel R. Bowden, Mark Mascaro, John Unguris, Caroline Ross
360˚, 540˚ and other complex transverse domain walls have been created in narrow Co wires connected to injection pads by cycling a magnetic field perpendicular to the wire length. The composite walls, formed by impingement of 180˚ transverse walls of
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