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Manufacturing

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Displaying 1926 - 1950 of 2183

Understanding Scanned Probe Oxidation of Silicon

January 1, 1998
Author(s)
John A. Dagata, T Inoue, J Itoh, H Yokoyama
A model for scanned probe microscope (SPM) silicon oxidation is presented. The model was derived from a consideration of the space-charge dependence of this solid-state reaction as a function of substrate doping type/level and has been verified

Vibration of a Room-Sized Airspring-Supported Slab

January 1, 1998
Author(s)
H Amick, B Sennewald, N C. Pardue, E C. Teague, Brian R. Scace
This paper reports the results of the finite element analysis and in situ testing of a large-scale (4 m x 10 m) pneumatically isolated concrete slab. The slab was constructed as a design prototype for next-generation metrology laboratories at the National

Voltage Modulation Scanned Probe Oxidation (Abstract)

January 1, 1998
Author(s)
John A. Dagata, T Inoue, J Itoh, K Matsumoto, H Yokoyama
This talk describes methods for enhancing the growth rate and electrical characteristics of nanostructures produced on silicon and titanium substrates by scanned probe microscope (SPM) oxidation. Direct oxidation of a substrate by the intense electric

Application of Transmission Electron Detection to SCALPEL Mask Metrology

November 1, 1997
Author(s)
R Farrow, Michael T. Postek, William J. Keery, Samuel N. Jones, J R. Lowney, M Blakey, L Fetter, J Griffith, J E. Liddle, L C. Hopkins, H A. Huggins, M Peabody, A Novembre
Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small as 0

Application of Trasmission Electron Detection to Scalpel Mask Metrology

November 1, 1997
Author(s)
R Farrow, Michael T. Postek, William J. Keery, Samuel N. Jones, J R. Lowney, M Blakey, L Fetter, A Liddle, L C. Hopkins, H A. Huggins, M Peabody, A Novembre, J Griffith
Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small as 0

Applications of the Rapidly Renewable Lap

November 1, 1997
Author(s)
R E. Parks, E Robert, Christopher J. Evans, David J. Roderick, J David, John A. Dagata
The rapidly renewable lap is based on the simple concept of generating the figure needed in a lap substrate and then replicating it into a thin film slumped over the substrate. Based on this concept, we describe how efficient laps can be constructed for

Measurements of the LIGO Pathfinder Optics

November 1, 1997
Author(s)
R E. Parks, Christopher J. Evans, P Sullivan, Lianzhen Shao, B Loucks
A number of 150 mm apertures in 250 mm diameter plano-concave optics with figure errors of a few nm were carefully tested using phase measuring interferometry and the data reduced using pixel based absolute testing techniques. We discuss some of the data

Metrology of Scattering with Angular Limitation Projection Electron Lithography Masks

November 1, 1997
Author(s)
J E. Liddle, M Blakey, T Saunders, R Farrow, L Fetter, C Kneurek, R Kasica, et al, M Peabody, Shannon L. Takach, D L. Windt, Michael T. Postek
Mask metrology is a vital part of any lithographic technology, both for control of the mask patterning process and also for ensuring that the contribution of the mask to the system error budget is within acceptable limits. For design rules of 0.13 ?m and

Uncertainty and Dimensional Calibrations

November 1, 1997
Author(s)
Theodore D. Doiron, John R. Stoup
The calculation of uncertainty for a measurement is an effort to set reasonable bounds for the measurement result according to standardized rules. Since every measurement produces only an estimate of the answer, the primary requisite of an uncertainty

Conformal Oxides on Si Surfaces

September 15, 1997
Author(s)
V W. Tsai, S. Wang, E. C. Williams, J Schneir, Ronald G. Dixson
The characteristics of the Si-vacuum interface were compared with the characteristics of the oxide-air interface formed following room temperature oxidation for a variety of samples. Scanning tunneling microscopy was used to measure the surface structure

Scattering From Sinusoidal Gratings

September 1, 1997
Author(s)
B C. Park, Theodore V. Vorburger, Thomas Germer, Egon Marx
Laser light scattering from holographic sinusoidal gratings has been investigated with a view to its use in the calibration of the linearity of BRDF instruments, a task that requires a wide dynamic range in the scattered intensity. An aluminum-coated

Uncertainty Estimation for Multiposition Form Error Metrology

September 1, 1997
Author(s)
William T. Estler, Christopher J. Evans, Lianzhen Shao
We analyze a general multiposition comparator measurement procedure that leads to partial removal of artifact error for a class of problems including roundness metrology, measurement of radial error motions of precision spindles, and figure error metrology

Blind Estimation of Tip Geometry in Scanned Probe Microscopy

August 1, 1997
Author(s)
John S. Villarrubia
Broadening of surface protrusions is a well-known imaging artifact in scanned probe microscope topographs. Blind reconstruction is a method for estimating the tip shape from the image of a tip characterizer, without independent knowledge of the

Experimental Study of Caesium 6PJ+ 6PJ --> 7PJ? + 6S energy pooling collisions and modeling of the excited atom density in the presence of optical pumping and radiation trapping

July 5, 1997
Author(s)
F D. Tomasi, J Huennekens, Zeina J. Kubarych, A Allegrini, A Fioretti, P Verker, S Milosevic
An experimental study of caesium energy pooling collisions at thermal energies, has been carried out in a capillary cell using diode laser excitation. Use of the capillary cell minimizes the effects of radiation trapping, but nonetheless, such effects

A Method to Characterize Overlay Tool Misalignments and Distortions

July 1, 1997
Author(s)
Richard M. Silver, James E. Potzick, Fredric Scire, Christopher J. Evans, Michael L. McGlauflin, Edward A. Kornegay, Robert D. Larrabee
A new optical alignment artifact under development at NIST is described. This structure, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. We
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