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Manufacturing

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Displaying 1926 - 1950 of 2179

Application of Trasmission Electron Detection to Scalpel Mask Metrology

November 1, 1997
Author(s)
R Farrow, Michael T. Postek, William J. Keery, Samuel N. Jones, J R. Lowney, M Blakey, L Fetter, A Liddle, L C. Hopkins, H A. Huggins, M Peabody, A Novembre, J Griffith
Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small as 0

Applications of the Rapidly Renewable Lap

November 1, 1997
Author(s)
R E. Parks, E Robert, Christopher J. Evans, David J. Roderick, J David, John A. Dagata
The rapidly renewable lap is based on the simple concept of generating the figure needed in a lap substrate and then replicating it into a thin film slumped over the substrate. Based on this concept, we describe how efficient laps can be constructed for

Measurements of the LIGO Pathfinder Optics

November 1, 1997
Author(s)
R E. Parks, Christopher J. Evans, P Sullivan, Lianzhen Shao, B Loucks
A number of 150 mm apertures in 250 mm diameter plano-concave optics with figure errors of a few nm were carefully tested using phase measuring interferometry and the data reduced using pixel based absolute testing techniques. We discuss some of the data

Metrology of Scattering with Angular Limitation Projection Electron Lithography Masks

November 1, 1997
Author(s)
J E. Liddle, M Blakey, T Saunders, R Farrow, L Fetter, C Kneurek, R Kasica, et al, M Peabody, Shannon L. Takach, D L. Windt, Michael T. Postek
Mask metrology is a vital part of any lithographic technology, both for control of the mask patterning process and also for ensuring that the contribution of the mask to the system error budget is within acceptable limits. For design rules of 0.13 ?m and

Uncertainty and Dimensional Calibrations

November 1, 1997
Author(s)
Theodore D. Doiron, John R. Stoup
The calculation of uncertainty for a measurement is an effort to set reasonable bounds for the measurement result according to standardized rules. Since every measurement produces only an estimate of the answer, the primary requisite of an uncertainty

Conformal Oxides on Si Surfaces

September 15, 1997
Author(s)
V W. Tsai, S. Wang, E. C. Williams, J Schneir, Ronald G. Dixson
The characteristics of the Si-vacuum interface were compared with the characteristics of the oxide-air interface formed following room temperature oxidation for a variety of samples. Scanning tunneling microscopy was used to measure the surface structure

Scattering From Sinusoidal Gratings

September 1, 1997
Author(s)
B C. Park, Theodore V. Vorburger, Thomas Germer, Egon Marx
Laser light scattering from holographic sinusoidal gratings has been investigated with a view to its use in the calibration of the linearity of BRDF instruments, a task that requires a wide dynamic range in the scattered intensity. An aluminum-coated

Uncertainty Estimation for Multiposition Form Error Metrology

September 1, 1997
Author(s)
William T. Estler, Christopher J. Evans, Lianzhen Shao
We analyze a general multiposition comparator measurement procedure that leads to partial removal of artifact error for a class of problems including roundness metrology, measurement of radial error motions of precision spindles, and figure error metrology

Blind Estimation of Tip Geometry in Scanned Probe Microscopy

August 1, 1997
Author(s)
John S. Villarrubia
Broadening of surface protrusions is a well-known imaging artifact in scanned probe microscope topographs. Blind reconstruction is a method for estimating the tip shape from the image of a tip characterizer, without independent knowledge of the

Experimental Study of Caesium 6PJ+ 6PJ --> 7PJ? + 6S energy pooling collisions and modeling of the excited atom density in the presence of optical pumping and radiation trapping

July 5, 1997
Author(s)
F D. Tomasi, J Huennekens, Zeina J. Kubarych, A Allegrini, A Fioretti, P Verker, S Milosevic
An experimental study of caesium energy pooling collisions at thermal energies, has been carried out in a capillary cell using diode laser excitation. Use of the capillary cell minimizes the effects of radiation trapping, but nonetheless, such effects

A Method to Characterize Overlay Tool Misalignments and Distortions

July 1, 1997
Author(s)
Richard M. Silver, James E. Potzick, Fredric Scire, Christopher J. Evans, Michael L. McGlauflin, Edward A. Kornegay, Robert D. Larrabee
A new optical alignment artifact under development at NIST is described. This structure, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. We

Conference Report: Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects, Gaithersburg, MD, May 20, 1996

July 1, 1997
Author(s)
M E. McKnight, J Martin, Michael Galler, Fern Y. Hunt, R Lipman, Theodore V. Vorburger, A Thompson
To help NIST researchers better understand industry''s needs, four NIST laboratories held a Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects on May 20, 1996. The four NIST laboratories are Building and Fire Research

Dimensional Metrology at the Nanometer Level: Combined SEM and PPM

July 1, 1997
Author(s)
Michael T. Postek, H Ho, L Harrison
The National Institute of Standards and Technology (NIST) is currently exploring the potentials afforded by the incorporation of a commercial proximal probe microscope (PPM) operating in the scanning tunneling or atomic force mode into a high resolution

Practical Aspects of Touch Trigger Probe Error Compensation

July 1, 1997
Author(s)
William T. Estler, Steven D. Phillips, Bruce R. Borchardt, Ted Hopp, M Levenson, K Eberhardt, Marjorie A. McClain
We present extensions of our prior work in modeling and correcting for pretravel variation errors in kinematic seat touch-trigger coordinate measuring machine (CMM) probes with straight styli. A simple correction term is shown to account for a range of
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