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Voltage Modulation Scanned Probe Oxidation (Abstract)

Published

Author(s)

John A. Dagata, T Inoue, J Itoh, K Matsumoto, H Yokoyama

Abstract

This talk describes methods for enhancing the growth rate and electrical characteristics of nanostructures produced on silicon and titanium substrates by scanned probe microscope (SPM) oxidation. Direct oxidation of a substrate by the intense electric field present at a suitably biased tip-sample junction is an accepted method for nanoelectric device fabrication. The inherent simplicity and generality of this approach has allowed many research groups to contribute to the exploration of novel prototyping strategies and towards a more complete understanding of the control factors needed to reliably fabricate functional devices.
Proceedings Title
Microprocesses and Nanotechnology Conference
Conference Dates
July 13-16, 1998
Conference Location
Kyoungju, KO
Conference Title
Microprocesses and Nanotechnology

Keywords

anodic oxidation, nanofabrication, scanned probe microscopy, silicon

Citation

Dagata, J. , Inoue, T. , Itoh, J. , Matsumoto, K. and Yokoyama, H. (1998), Voltage Modulation Scanned Probe Oxidation (Abstract), Microprocesses and Nanotechnology Conference, Kyoungju, KO (Accessed April 19, 2024)
Created January 1, 1998, Updated February 19, 2017