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Manufacturing

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Displaying 1951 - 1975 of 2179

Statistical Measure for the Sharpness of the SEM Image

July 1, 1997
Author(s)
Nien F. Zhang, Michael T. Postek, Robert D. Larrabee
Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an

Inexpensive Digital Imaging?

June 1, 1997
Author(s)
Michael T. Postek, Andras Vladar
The capture of digital images through the use of a frame grabber provides tremendous advantages to scanning electron microscopy. Accessory frame grabbers can range in price from very inexpensive to several thousand dollars. This work investigates the

Glass and Dimensional Metrology

April 1, 1997
Author(s)
Theodore D. Doiron
Ordinary glass, even good optical quality glass, will shrink up to 20 micrometers/meter over the first few years after its manufacture. Gages made of glass are therefore not suitable as high accuracy artifacts unless they are calibrated often. Better

High-Speed Grinding - Fundamentals and State of the Art in Europe, Japan, and the USA

April 1, 1997
Author(s)
F Klocke, E Brinksmeier, Christopher J. Evans, T Howes, I Inasaki, E Minke, H Tonshoff, J A. Webster, D Stuff
This paper describes the technological basis and the current state of the art in the field of high speed grinding. The technological fundamentals of high speed grinding are first of all presented on the basis of the kinematics of the chip-forming process

Photomask Metrology in the Era of Neolithography

February 1, 1997
Author(s)
James E. Potzick
The appearance of smaller photomask feature sizes, high density patterns, and optical enhancements such as phase shifters and OPC features, and the increasing importance of subresolution mask characteristics, can render traditional mask metrology

A Differential Wavelength Meter for Laser Tuning

January 1, 1997
Author(s)
Lowell P. Howard, Jack A. Stone Jr.
A simple interferometer for matching the wavelengths of tunable lasers is described. Our interferometer uses the angular dispersion of a diffraction grating at the Littrow angle to produce a tilted wavefront with respect to a reference mirror in an

Benchmarking the Length Measurement Capabilities of the National Institute of Standards and Technology

January 1, 1997
Author(s)
Richard M. Silver, J Land, Jack A. Stone Jr., Ronald G. Dixson, Bryon S. Faust, James E. Potzick, Michael T. Postek, et al
A cross-section of measurements from the Precision Engineering Division within the National Institute of Standards and Technology is benchmarked against other leading National Measurement Institutes. We present a variety of length-related calibration

Calibration and Fabrication Facilities for Optical Surfaces

January 1, 1997
Author(s)
Theodore V. Vorburger, Christopher J. Evans, C Asmail
NIST has calibration facilities and research services available for characterization of optical surfaces and optical figuring and finishing. The calibration facilities are for measurement of optical scatter, figure, and surface finish, and the fabrication

Ductile-Regime Grinding of Brittle Materials

January 1, 1997
Author(s)
Kenneth Blaedel, John S. Taylor, Christopher J. Evans
Under appropriate conditions, brittle materials may be ground to produce surfaces with no observable fracture damage. This chapter reviews the techniques for producing such surfaces and the mechanisms of material removal involved.

Establishing a Worldwide Unified Rockwell Hardness Scale With Metrology Traceability

January 1, 1997
Author(s)
Jun-Feng Song, Samuel Low, David J. Pitchure, A Germak, S Desogus, T Polzin, H Yang, H Ishida, G Barbato
Recently developed microform measurement techniques have reduced the measurement uncertainties in the geometry of Rockwell diamond indenters. It is now possible to establish standard grade Rockwell diamond indenters characterized by high geometry

Finish and Figure Metrology for Soft X-ray Optics

January 1, 1997
Author(s)
T Mcwaid
The performance of high quality optics relies heavily on their geometrical properties of surface finish and figure. The surface finish consists of the short spatial-wavelength departures from perfect smoothness and leads to scattering of the incident light

Hybrid Optical-Electrical Overlay Test Structure

January 1, 1997
Author(s)
Michael W. Cresswell, Robert Allen, L Linholm, William F. Guthrie, William B. Penzes, A Gurnell
This paper describes the exploratory use of electrical test structures to enable the calibration of optical overlay instruments of the type used to monitor semiconductor-device fabrication processes. Such optical instruments are known to be vulnerable to

Industrial Uses of STM and AFM

January 1, 1997
Author(s)
Theodore V. Vorburger, John A. Dagata, G. Wilkening, K Iizuka
We review the field of STM and AFM as applied to industrial problems, and we classify the applications into four classes: research with potential benefit to industry, research performed by industry, applications off-line in manufacturing, and applications

Integral Equations for Scattering by a Particle in a Layer

January 1, 1997
Author(s)
Egon Marx
The single integral equation method is applied to the scattering of electromagnetic waves by particles in a layer on top of a substrate. A second layer on top of the first one can have indentations.

Intelligent Gradient-Based Search of Incompletely Defined Design Spaces

January 1, 1997
Author(s)
Mark Schwabacher, A Gelsey
Gradient-based numerical optimization of complex engineering designs o ers the promise of rapidly producing better designs. However, such methods generally assume that the objective function and constraint functions are continuous, smooth, and de- ned

Measurement Comparison of Stylus Radii

January 1, 1997
Author(s)
Jun-Feng Song, Theodore V. Vorburger
Three methods were used for measuring the radii of the same stylus of our stylus instrument. The measurement results were compared and showed good agreement. Using razor blade tracing, the stylus radius was measured as r=1.60um with an expanded uncertainty
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