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Conferences

Odyssey Text Independent Evaluation Data

Author(s)
Mark A. Przybocki, Alvin F. Martin
We discuss the text-independent data supplied for the 2001: A Speaker Odyssey evaluation track. We cover the data creation and selection process, and we present...

Cu Electrodeposition for On-Chip Interconnections

Author(s)
Gery R. Stafford, Thomas P. Moffat, V D. Jovic, David R. Kelley, John E. Bonevich, Daniel Josell, Mark D. Vaudin, N G. Armstrong, W H. Huber, A Stanishevsky
The electrochemical behavior of copper in copper sulfate - sulfuric acid, containing various combinations of NaCl, sodium 3 mercapto-1 propanesulfonate (MPSA)...

Domain Stability in PZT Thin Films

Author(s)
Grady S. White, J Blendell, Lin-Sien H. Lum
M measurements were made on textured PZT thin films excited by a 1 V rms in the presence of various DC biasing voltages. Apparent domain pinning sites were...

A Numerical Method for Color Uncertainty

Author(s)
Yoshihiro Ohno
A method for calculating uncertainties of color quantities has been developed using a numerical approach based on the ISO Guide to the Expression of Uncertainty...

SEM Sentinel - SEM Performance Measurement System

Author(s)
Bradley N. Damazo, Andras Vladar, Alice V. Ling, M A. Donmez, Michael T. Postek, Crossley E. Jayewardene
This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope...

Kinematic Modeling and Analysis of a Planar Micro-Positioner

Author(s)
Nicholas G. Dagalakis, John A. Kramar, E Amatucci, Robert Bunch
The static and dynamic performance of a control system depends on the accuracy of the mathematical model of the plant that is being controlled. In this work...

Overlay Metrology: Recent Advances and Future Solutions

Author(s)
Richard M. Silver, Jay S. Jun, S Fox, Edward A. Kornegay
As devices shrink and clock speeds continue to increase, process control and measurement of I critical dimension linewidths and the essential overlay of...

Neolithography Consortium: A Progress Report

Author(s)
James E. Potzick
The role of process simulation is becoming an increasingly important part of microlithography process control and photomask metrology as wafer feature sizes...
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