Dowell, M.
, Cromer, C.
, Jones, R.
, Keenan, D.
and Scott, T.
(2001),
New Developments in Deep Ultraviolet Laser Metrology for Photolithography, AIP Conf. Proc., Characterization and Metrology for ULSI Technology 2000, Gaithersburg, MD, USA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=17492
(Accessed October 4, 2024)