New Developments in Deep Ultraviolet Laser Metrology for Photolithography
Marla L. Dowell, Christopher L. Cromer, Richard D. Jones, Darryl A. Keenan, Thomas Scott
Current and future laser measurement services at 157, 193, and 248 nm will be reviewed. Laser power and energy measurements at 193 nm will be presented, electrical calibration issues will be reviewed. We report an overall calibration uncertainty of laser power and energy meters of less than 2%. Characterization measurements for ultraviolet materials also will be discussed.
AIP Conf. Proc., Characterization and Metrology for ULSI Technology 2000
, Cromer, C.
, Jones, R.
, Keenan, D.
and Scott, T.
New Developments in Deep Ultraviolet Laser Metrology for Photolithography, AIP Conf. Proc., Characterization and Metrology for ULSI Technology 2000, Gaithersburg, MD, USA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=17492
(Accessed November 30, 2023)