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New Developments in Deep Ultraviolet Laser Metrology for Photolithography

Published

Author(s)

Marla L. Dowell, Christopher L. Cromer, Richard D. Jones, Darryl A. Keenan, Thomas Scott

Abstract

Current and future laser measurement services at 157, 193, and 248 nm will be reviewed. Laser power and energy measurements at 193 nm will be presented, electrical calibration issues will be reviewed. We report an overall calibration uncertainty of laser power and energy meters of less than 2%. Characterization measurements for ultraviolet materials also will be discussed.
Proceedings Title
AIP Conf. Proc., Characterization and Metrology for ULSI Technology 2000
Volume
550
Conference Dates
June 26-29, 2000
Conference Location
Gaithersburg, MD, USA

Keywords

laser metrology, UV lithography

Citation

Dowell, M. , Cromer, C. , Jones, R. , Keenan, D. and Scott, T. (2001), New Developments in Deep Ultraviolet Laser Metrology for Photolithography, AIP Conf. Proc., Characterization and Metrology for ULSI Technology 2000, Gaithersburg, MD, USA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=17492 (Accessed May 21, 2024)

Issues

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Created December 31, 2000, Updated October 12, 2021