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Conferences

Method of Measuring Shunt Resistance of Photodiodes

Author(s)
P R. Thompson, Thomas C. Larason
A method of measuring the shunt resistance of diodes, specifically photodiodes, is examined and the procedure of how the method is implemented using LabVIEW is

Measurements of Static Noise in Display Images

Author(s)
John W. Roberts, Edward F. Kelley
The appearance of noise on a display is an important usability issue. Sources of noise include electrical interference, display driver artifacts, resampling

Hard X-Ray Spectrometers for NIF

Author(s)
J Seely, G Holland, Charles Brown, R Deslattes, Lawrence T. Hudson, P Bell, M Miller, C Back
A NIF core diagnostic instrument has been designed and will be fabricated to record x-ray spectra in the 1.1 to 20.1 keV energy range. The High-Energy

A Decomposition-Based Approach to Layered Manufacturing

Author(s)
R Janardan, I Ilinkin, J Schwerdt, Miles E. Smid, J J. Majhi, Ram D. Sriram
This paper introduces a new approach for improving the performance and versatility of Layered Manufacturing (LM), which is an emerging technology that makes it

Atomic Level Surface Metrology

Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Jun-Feng Song, Thomas Brian Renegar, Joseph Fu, Ndubuisi George Orji, V W. Tsai, E. C. Williams, H Edwards, D Cook, P West, R Nyffenegger
MotivationSemiconductor wafers and many types of optical elementsrequire ultra-smooth surfaces in order to functionas specifiedExamples:Laser gyro mirrors with

Effect of Aluminum Flake Orientation on Coating Appearance

Author(s)
L Sung, Maria Nadal, M E. McKnight, Egon Marx, R Dutruc, B Laurenti
The orientation of platelet-like pigments in coatings is affected by the processing conditions resulting in appearance variations of the final product. A set of

MEMS Standardization

Author(s)
Michael Gaitan
Standardization and metrology are critical infrastructure needs for the MEMS industry. These needs incluse standard test structures and test methods, and