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Conferences

Obtaining Spectral Data for Colorimetry

Author(s)
Yoshihiro Ohno
Simulation analyses have been conducted on the colorimetric errors associated with the data interval, bandpass, and wavelength errors of a spectrometer, using

Uncertainty Analysis of Reflectance Colorimetry

Author(s)
E A. Early, Maria E. Nadal
The specification of the color of an object is important, sometimes crucially, to its acceptability for an intended application. When quantitative measurements

Control of Coherent Light and its Broad Applications

Author(s)
Jun Ye, R J. Jones, K W. Holman, S M. Foreman, D J. Jones, S T. Cundiff, John L. Hall, T M. Fortier, A Marian
A remarkable synergy has been formed between the technology of precision optical frequency metrology and ultrafast laser science. This has resulted in control

Towards Modeling the Evolution of Product Families

Author(s)
Fujun Wang, Steven J. Fenves, Sudarsan Rachuri, Ram D. Sriram
A strategy successfully used by manufacturing companies is to develop product families so as to offer a variety of products with reduced development costs. This

Evolutions in Hardness Scales Definition

Author(s)
G Barbato, A G. Germak, K -. Herrmann, Samuel Low
A conventional characteristic of hardness measurements in the strong dependency on the official definition of each scale. For this reason, and to assure a good

Investigation of BARC-Resist Interfacial Interactions

Author(s)
C Devadoss, Yijun Wang, R Puligadda, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, E Jablonski, Daniel A. Fischer, S Sambasivan, Eric K. Lin, Wen-Li Wu
Results are reported from studies of (A) surface versus bulk chemistry of BARC materials as a function of cure temperature, (B) the dependence of the thickness

Design and Performance of Capping Layers for EUV Multilayer Mirrors

Author(s)
Sasa Bajt, H N. Chapman, Nhan Nguyen, J Alameda, J C. Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles Tarrio, Steven Grantham
The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure

Functional Tolerancing of a Gearbox

Author(s)
H Wang, Utpal Roy, Sudarsan Rachuri, Ram D. Sriram, Kevin W. Lyons
This paper proposes a scheme for the tolerance specification that uses the features? function information and mating condition attributes in the assembly to

Energy Distribution of Interface Traps in High-K Gated MOSFETs

Author(s)
Jin-Ping Han, Eric M. Vogel, Evgeni Gusev, C. D'Emic, Curt A. Richter, Da-Wei Heh, John S. Suehle
We use variable rise/fall-time charge pumping (CP) to determine the energy distribution of interface trap density (Dit) and capture cross-section of electrons
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