NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Conferences

Authenticating Users on Handheld Devices

Author(s)
Wayne Jansen
Adequate user authentication is a persistent problem, particularly with handheld devices, which tend to be highly personal and at the fringes of an organization

Implementation of a Reference Measurement System Using CD-AFM

Author(s)
Ronald G. Dixson, Theodore V. Vorburger, Angela Guerry, Marylyn H. Bennett, B Bunday
International SEMATECH (ISMT) and the National Institute of Standards and Technology (NIST) are working together to improve the traceability of atomic force

Calibration Strategies for Overlay and Registration Metrology

Author(s)
Richard M. Silver, Michael T. Stocker, Ravikiran Attota, M R. Bishop, Jay S. Jun, Egon Marx, M P. Davidson, Robert D. Larrabee
Critical dimensions in current and next generation devices are driving the need for tighter overlay registration tolerances and improved overlay metrology tool

Manufacturing Interoperability

Author(s)
Steven R. Ray, Albert T. Jones
As manufacturing and commerce become ever more global in nature, companies are increasingly dependent upon the efficient and effective exchange of information

Electron Beam Metrology of 193 nm Resists at Ultra Low Voltage

Author(s)
N. Sullivan, Ronald G. Dixson, B Bunday, M Mastovich, P Knutruda, P Fabre, R Brandoma
Resist slimming under electron beam exposure introduces significant measurement uncertainty in the metrology of 193 nm resists. Total critical dimension (CD)

Updated NIST Photomask Linewidth Standard

Author(s)
J Pedulla, James E. Potzick, Michael T. Stocker
NIST is preparing to issue the next generation in its line of binary photomask linewidth standards. Called SRM 2059, it was developed for calibrating

IEEE TC-10: What's It All About?

Author(s)
Thomas E. Linnenbrink, W. B. Boyer, Nicholas Paulter, S. J. Tilden
The IEEE TC-10 comprises three working groups that have or are generating standards related to the measurement of signals. One of these groups has recently

Luminance probes for contrast measurements in medical displays

Author(s)
Aldo Badano, Scott Pappada, Edward F. Kelley, Michael J. Flynn, Sandrine Martin, Jerzy Kanicki
We report on a comparative study that examines four conic luminance probes in their ability to measure small-spot display contrast. We performed linear scans of

New Method to Enhance Overlay Tool Performance

Author(s)
Ravikiran Attota, Richard M. Silver, Michael T. Stocker, Egon Marx, Jay S. Jun, M P. Davidson, Robert D. Larrabee
New methods to enhance and improve algorithm performance and data analysis are being developed at NIST for overlay measurement applications. Both experimental

A Repository of Sensor Data for Autonomous Driving Research

Author(s)
Michael O. Shneier, Tommy Chang, Tsai Hong Hong, Geraldine S. Cheok, Harry A. Scott, Steven Legowik, Alan M. Lytle
We describe a project to collect and disseminate sensor data for autonomous mobility research. Our goals are to provide data of known accuracy and precision to

Ground Truth and Benchmarks for Performance Evaluation

Author(s)
A Takeuchi, Michael O. Shneier, Tsai H. Hong, Christopher J. Scrapper Jr, Geraldine Cheok
Progress in algorithm development and transfer of results to practical applications such as military robotics requires the setup of standard tasks, of standard
Was this page helpful?