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Physical Measurement Laboratory

Nanoscale Device Characterization Division

Projects/Programs

Displaying 26 - 50 of 71
Diagram showing our multidimensional spectroscopy experiment.

Femtosecond Nonlinear Optical Spectroscopy of Nanoscale Materials

Ongoing
The purpose of this project is to develop and refine spectroscopic techniques based on nonlinear optics for the study of novel materials. Measurements that isolate the nonlinear response are often better able to uncover physical processes that, in the linear response, are subtle and hard to isolate

Graphene

Ongoing
Two remarkable features of graphene that are opening avenues to multiple applications are its high transport carrier mobility and the broad tunability of its electronic properties. Graphene charge carriers can be tuned continuously from negative carriers (i.e., electrons) to positive carriers (holes
Microscope image of a crossbar array

Hardware Accelerators for Neural Networks

Ongoing
One promising candidate for building a hardware accelerator comes from the field of spintronics, where information is carried by electronic spin rather than charge. Magnetic tunnel junctions are particularly suited because of their multifunctionality and compatibility with standard integrated
Temporal Chip

Hardware Accelerators for Statistical Computing

Ongoing
Finding good solutions to many hard problems, like combinatorial optimization and traveling salesman problems, counterintuitively requires making the estimated solution worse before making it better. This situation results from many hard problems having many “solutions” that cannot be improved
Project Graphene TMCO

Integer and Fractional Quantum Hall Effect

Ongoing
Integer Quantum Hall Effect Graphene is a unique 2DEG system that is exposed at the surface and can be probed with scanning tunneling measurements.  A hallmark of graphene that results from the unique linear dispersion is that the energy spacing between the Landau levels is not constant but varies
Small array of transistors designed for single device integration.

Integrated CMOS Testbeds for Nanoelectronics and Machine Learning

Ongoing
The increasingly complex device requirements for next-generation computing architectures such as neuromorphic computing or nanoelectronic machine learning accelerators present challenges for researchers across the spectrum of institutions, from small businesses and universities to government
Crossbar Memory Arrays

Integrated Testbeds for Advanced Metrology

Ongoing
Crossbar Memory Arrays An especially prolific structure in memory architectures aimed at accelerating neural network operation is the crossbar array (Fig. 1). We produce medium-scale arrays that hold up to 20,000 nanodevices which can be characterized, read from, and written to individually or in
Custom-built wafer level probes in position to perform EDMR measurements on fully processed transistors.

Magnetic Resonance Spectroscopy

Ongoing
Custom-built wafer level probes in position to perform EDMR measurements on fully processed transistors. Electronics are all around us and have completely reinvented nearly every aspect of our society. Virtually any system, large or small, contains some type of electronics that may or may not be
Prototype cryogenic atomic force microscope system with nanoscale electron spin resonance capability

Manipulation and Imaging of Dilute Densities of Electron Spins

Ongoing
While the characteristics of the unpaired electrons which are trapped in these bonding errors have a dramatic impact on the macroscale material properties, observing these same unpaired electrons has proven quite difficult. These unpaired electrons are transient in time, temperature, and pressure
Schematic diagram of a 3D stacked integrated circuit (3D-SIC), achieved using copper through-silicon via interconnects.

Metrology for Emerging Integrated Systems

Ongoing
The Emerging Integrated Systems Metrology program supports measurements for advanced manufacturing and secure nano-manufacturing, novel devices and electronic materials. Specifically, the program aims to develop the metrology required to enable a quantitative assessment and physical understanding of

Metrology for Printing and Graphic Arts Substrates

Ongoing
Paper is a complex, heterogeneous, multi-phased material. While there is a significant body of work related to the dielectric properties of cellulose, comparatively fewer studies have been done on printing and writing grades of paper. In our previous work, we have been able to differentiate between
Moire Systems Susceptibility TDBG

Moiré Systems

Ongoing
Twisted double bilayer graphene The moiré systems of magic angle twisted bilayer graphene (MATBG) and related heterostructures support topological bands with nonzero Chern number, which is derived from the Berry curvature of the Bloch wave functions. Berry curvature is intimately related to orbital
Layout of the Nanotechnology Xccelerator Reticle with 30 unique tiles occupying 41 different slots within the reticle.

The Nanotechnology Xccelerator

Ongoing
The Nanotechnology Xccelerator was announced on September 13, 2022 and was officially accepted for production at Skywater Technology Foundry using the Sky130 technology in Q1 2024. Sky130, which comes in both a conventional and open-source process design kit, is a 5-metal layer process. To
EBIC Current

Neuromorphic Device Measurements

Ongoing
One type of device that is emerging as an attractive artificial synapse is the resistive switch, or memristor. These devices, which usually consist of a thin layer of oxide between two electrodes, have conductivity that depends on their history of applied voltage, and thus have highly nonlinear
schematic of the MOTIS ion beam source

Novel Sources for Focused-ion Beams

Completed
Commercial focused ion beams (FIBs) are used in a wide variety of applications. For example, they serve as diagnostic tools, slicing through a nanodevice to expose its internal structure. They can also shape nanoscale materials either by adding atoms to a structure or by shaving them off. And they
EDMR set up to measure the electrode process of an electrochemical cell.

Operando Measurements of Electrochemical (Charge-transfer) Processes

Ongoing
There are two ways to study a very fast process such as charge transfer. One can use very high-speed measurement that can follow the effect of the process, or one use a method that is sensitive only to the process itself. Either way has its weakness. Many fast measurements can follow the process
NIST 193 nm Microscope.

Optical Methods for 3-D Nanostructure Metrology (Archived)

Completed
This project develops new approaches to optical microscopy based on a high magnification optical platform that samples the full 3-D scattered field. Both the semiconductor industry and the evolving nanomanufacturing sector are facing enormous challenges measuring nanometer scale features over large
Spectroscopic ellipsometry measurement of a 2D monolayer and the optical property for such a thin layer.

Optical and Optoelectronic Materials Characterization

Ongoing
Today's electronics have reached a point where sheer computation power has combined form and function as the key driver of large consumer markets. The demand for portable and pervasive electronics with greater functionality promises significant changes over the next decades in how society interacts
Schematic of quantum entangled molecules or nanoparticles in dual cavity system.

Photonic Quantum State Imaging Metrology

Ongoing
Fundamental understanding of quantum behavior of single molecules, which is a favorable candidate for quantum information processing technologies, has advanced gradually, relying on empirical studies mostly. This requires a measurement platform to study fundamental quantum characteristics in single
A 3" wafer is seen concentric with the lower plasma electrode.

Precision Materials for Quantum Devices

Ongoing
MBE System Our fabrication system is composed of ultra-high vacuum (UHV) chambers that support the in-vacuum exchange of 75 mm wafers without exposure to air as seen in Figure 1. These chambers are: (1) a deposition chamber with electron gun deposition, UHV compatible sputter guns, in situ shadow
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