This project develops new approaches to optical microscopy based on a high magnification optical platform that samples the full 3-D scattered field. Both the semiconductor industry and the evolving nanomanufacturing sector are facing enormous challenges measuring nanometer scale features over large areas, needed for effective manufacturing process control of products that incorporate billions of nanoscale features. Optical microscopy is a high-throughput metrology methodology that provides a unique advantage since it is a high-bandwidth measurement method that is inherently parallel.
Measurements with sensitivity to features less than one-twentieth the wavelength can be made by analysis of scattered light profiles and the use of physics-based modeling. Extensive